Paper Abstract and Keywords |
Presentation |
2017-03-02 11:20
Efficient Local Pattern Modification Method using FM Algorithm in LELE Double Patterning Atsushi Ogashira, Shimpei Sato, Atsushi Takahashi (Tokyo TECH) VLD2016-113 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
In current semiconductor design, high quality and short time design is required.
In an advanced lithography technology in recent years, even in a pattern that satisfies design rule may contain spot that degrades the yield which is called hot spot.
Therefore, it is required to obtain a pattern without a hot spot in a short time and to
converge the design.
However, the time required for lithography simulation for checking the existence of hot spots
is long, and a new hot spot may be generated by pattern modification for eliminating hot spots.
Therefore, in this research, we propose a method to obtain a pattern modification with short simulation time required after modification, while suppressing the occurrence of new hot spots by modification.
By using a pattern modification obtained by the method, it is expected that the design can be converged in a short time and an efficient semiconductor design can be achieved. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
pattern modification / hot spot / double patterning / / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 116, no. 478, VLD2016-113, pp. 67-72, March 2017. |
Paper # |
VLD2016-113 |
Date of Issue |
2017-02-22 (VLD) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
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VLD2016-113 |
Conference Information |
Committee |
VLD |
Conference Date |
2017-03-01 - 2017-03-03 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Okinawa Seinen Kaikan |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
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Paper Information |
Registration To |
VLD |
Conference Code |
2017-03-VLD |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Efficient Local Pattern Modification Method using FM Algorithm in LELE Double Patterning |
Sub Title (in English) |
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Keyword(1) |
pattern modification |
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hot spot |
Keyword(3) |
double patterning |
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1st Author's Name |
Atsushi Ogashira |
1st Author's Affiliation |
Tokyo Institute of Technology (Tokyo TECH) |
2nd Author's Name |
Shimpei Sato |
2nd Author's Affiliation |
Tokyo Institute of Technology (Tokyo TECH) |
3rd Author's Name |
Atsushi Takahashi |
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Tokyo Institute of Technology (Tokyo TECH) |
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Speaker |
Author-1 |
Date Time |
2017-03-02 11:20:00 |
Presentation Time |
25 minutes |
Registration for |
VLD |
Paper # |
VLD2016-113 |
Volume (vol) |
vol.116 |
Number (no) |
no.478 |
Page |
pp.67-72 |
#Pages |
6 |
Date of Issue |
2017-02-22 (VLD) |
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