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Paper Abstract and Keywords
Presentation 2017-10-25 16:00
Nanoscale conformal doping technology by spin on diffusion source
Tetsuro Kinoshita, Shunichi Mashita, Takuya Ohashi, Yoshihiro Sawada, Yohei Kinoshita, Satoshi Fujimura (TOK) SDM2017-53 Link to ES Tech. Rep. Archives: SDM2017-53
Abstract (in Japanese) (See Japanese page) 
(in English) We developed a coating material which can form nanoscale conformal film on the wafer with 3D structure. In this study, conformal doping to 3D structure and control of diffusion profile by tuning the process condition were demonstrated by using the coating material introduced various kinds of dopant element. This technique can be applied to the conformal doping process to FinFET or DTI of CIS with 3D structure.
Keyword (in Japanese) (See Japanese page) 
(in English) conformal / doping / diffusion / image sensor / FinFET / / /  
Reference Info. IEICE Tech. Rep., vol. 117, no. 260, SDM2017-53, pp. 21-24, Oct. 2017.
Paper # SDM2017-53 
Date of Issue 2017-10-18 (SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
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reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF SDM2017-53 Link to ES Tech. Rep. Archives: SDM2017-53

Conference Information
Committee SDM  
Conference Date 2017-10-25 - 2017-10-26 
Place (in Japanese) (See Japanese page) 
Place (in English) Niche, Tohoku Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Process Science and New Process Technology 
Paper Information
Registration To SDM 
Conference Code 2017-10-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Nanoscale conformal doping technology by spin on diffusion source 
Sub Title (in English)  
Keyword(1) conformal  
Keyword(2) doping  
Keyword(3) diffusion  
Keyword(4) image sensor  
Keyword(5) FinFET  
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1st Author's Name Tetsuro Kinoshita  
1st Author's Affiliation Tokyo Ohka Kogyo co., LTD. (TOK)
2nd Author's Name Shunichi Mashita  
2nd Author's Affiliation Tokyo Ohka Kogyo co., LTD. (TOK)
3rd Author's Name Takuya Ohashi  
3rd Author's Affiliation Tokyo Ohka Kogyo co., LTD. (TOK)
4th Author's Name Yoshihiro Sawada  
4th Author's Affiliation Tokyo Ohka Kogyo co., LTD. (TOK)
5th Author's Name Yohei Kinoshita  
5th Author's Affiliation Tokyo Ohka Kogyo co., LTD. (TOK)
6th Author's Name Satoshi Fujimura  
6th Author's Affiliation Tokyo Ohka Kogyo co., LTD. (TOK)
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Speaker Author-1 
Date Time 2017-10-25 16:00:00 
Presentation Time 30 minutes 
Registration for SDM 
Paper # SDM2017-53 
Volume (vol) vol.117 
Number (no) no.260 
Page pp.21-24 
#Pages
Date of Issue 2017-10-18 (SDM) 


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