Paper Abstract and Keywords |
Presentation |
2017-10-25 16:00
Nanoscale conformal doping technology by spin on diffusion source Tetsuro Kinoshita, Shunichi Mashita, Takuya Ohashi, Yoshihiro Sawada, Yohei Kinoshita, Satoshi Fujimura (TOK) SDM2017-53 Link to ES Tech. Rep. Archives: SDM2017-53 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We developed a coating material which can form nanoscale conformal film on the wafer with 3D structure. In this study, conformal doping to 3D structure and control of diffusion profile by tuning the process condition were demonstrated by using the coating material introduced various kinds of dopant element. This technique can be applied to the conformal doping process to FinFET or DTI of CIS with 3D structure. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
conformal / doping / diffusion / image sensor / FinFET / / / |
Reference Info. |
IEICE Tech. Rep., vol. 117, no. 260, SDM2017-53, pp. 21-24, Oct. 2017. |
Paper # |
SDM2017-53 |
Date of Issue |
2017-10-18 (SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
SDM2017-53 Link to ES Tech. Rep. Archives: SDM2017-53 |
Conference Information |
Committee |
SDM |
Conference Date |
2017-10-25 - 2017-10-26 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Niche, Tohoku Univ. |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Process Science and New Process Technology |
Paper Information |
Registration To |
SDM |
Conference Code |
2017-10-SDM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Nanoscale conformal doping technology by spin on diffusion source |
Sub Title (in English) |
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Keyword(1) |
conformal |
Keyword(2) |
doping |
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diffusion |
Keyword(4) |
image sensor |
Keyword(5) |
FinFET |
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1st Author's Name |
Tetsuro Kinoshita |
1st Author's Affiliation |
Tokyo Ohka Kogyo co., LTD. (TOK) |
2nd Author's Name |
Shunichi Mashita |
2nd Author's Affiliation |
Tokyo Ohka Kogyo co., LTD. (TOK) |
3rd Author's Name |
Takuya Ohashi |
3rd Author's Affiliation |
Tokyo Ohka Kogyo co., LTD. (TOK) |
4th Author's Name |
Yoshihiro Sawada |
4th Author's Affiliation |
Tokyo Ohka Kogyo co., LTD. (TOK) |
5th Author's Name |
Yohei Kinoshita |
5th Author's Affiliation |
Tokyo Ohka Kogyo co., LTD. (TOK) |
6th Author's Name |
Satoshi Fujimura |
6th Author's Affiliation |
Tokyo Ohka Kogyo co., LTD. (TOK) |
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Speaker |
Author-1 |
Date Time |
2017-10-25 16:00:00 |
Presentation Time |
30 minutes |
Registration for |
SDM |
Paper # |
SDM2017-53 |
Volume (vol) |
vol.117 |
Number (no) |
no.260 |
Page |
pp.21-24 |
#Pages |
4 |
Date of Issue |
2017-10-18 (SDM) |
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