| Paper Abstract and Keywords |
| Presentation |
2018-01-25 13:40
Luminescence characteristics of GaN films grown by chemical vapor deposition using Ga vapor Yuichiro Masuda, Tsuyoshi Nagase, Wataru Kunieda, Tetsuya Kouno, Hiroko Kominami, Kazuhiko Hara (Shizuoka Univ.) EID2017-31 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
We have grown gallium nitride (GaN) thin films on c-plane sapphire substrate by chemical vapor deposition (CVD) using Ga vapor and NH3. It was found that the improvement of crystalline and luminescence characteristics of the GaN films can be achieved for the CVD of this study by depositing a low temperature buffer layer at 600 ℃ before the growth of GaN at high temperature (1100 ℃). It was also suggested that the heat treatment in Ga vapor prior to high temperature growth enhances the lateral growth of GaN films without depositing a low temperature buffer layer, which resulted in the improvement of luminescence property. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
gallium nitride / photoluminescence / chemical vapor deposition / thin films growth / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 117, no. 411, EID2017-31, pp. 5-8, Jan. 2018. |
| Paper # |
EID2017-31 |
| Date of Issue |
2018-01-18 (EID) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
EID2017-31 |
| Conference Information |
| Committee |
EID ITE-IDY IEIJ-SSL SID-JC IEE-EDD |
| Conference Date |
2018-01-25 - 2018-01-26 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Shizuoka Univ., Hamamatsu |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
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| Paper Information |
| Registration To |
EID |
| Conference Code |
2018-01-EID-IDY-SSL-JC-EDD |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Luminescence characteristics of GaN films grown by chemical vapor deposition using Ga vapor |
| Sub Title (in English) |
|
| Keyword(1) |
gallium nitride |
| Keyword(2) |
photoluminescence |
| Keyword(3) |
chemical vapor deposition |
| Keyword(4) |
thin films growth |
| Keyword(5) |
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| Keyword(6) |
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| 1st Author's Name |
Yuichiro Masuda |
| 1st Author's Affiliation |
Shizuoka University (Shizuoka Univ.) |
| 2nd Author's Name |
Tsuyoshi Nagase |
| 2nd Author's Affiliation |
Shizuoka University (Shizuoka Univ.) |
| 3rd Author's Name |
Wataru Kunieda |
| 3rd Author's Affiliation |
Shizuoka University (Shizuoka Univ.) |
| 4th Author's Name |
Tetsuya Kouno |
| 4th Author's Affiliation |
Shizuoka University (Shizuoka Univ.) |
| 5th Author's Name |
Hiroko Kominami |
| 5th Author's Affiliation |
Shizuoka University (Shizuoka Univ.) |
| 6th Author's Name |
Kazuhiko Hara |
| 6th Author's Affiliation |
Shizuoka University (Shizuoka Univ.) |
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| Speaker |
Author-1 |
| Date Time |
2018-01-25 13:40:00 |
| Presentation Time |
10 minutes |
| Registration for |
EID |
| Paper # |
EID2017-31 |
| Volume (vol) |
vol.117 |
| Number (no) |
no.411 |
| Page |
pp.5-8 |
| #Pages |
4 |
| Date of Issue |
2018-01-18 (EID) |