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Paper Abstract and Keywords
Presentation 2018-03-01 09:25
Efficient Generation of Lithography Hotspot Detector based on Transfer Learning
Shuhei Suzuki, Yoichi Tomioka (UoA) VLD2017-106
Abstract (in Japanese) (See Japanese page) 
(in English) As semiconductor features shrink in size, the fidelity of the layout pattern transferred onto the wafer decreases. A layout pattern that induces defects with high probability is called hotspot (HS). In advanced manufacturing process, it is indispensable to detect and fix such HS at the design stage in order to improve the yield and chip reliability. In recent years, HS detection method using machine learning has received attractive attention because it is fast and relatively accurate. However, it is necessary to collect a large amount of training samples under the target condition such as process and light condition. Therefore, construction of HS detector requires much effort. In this research, we propose a method to generate a HS detector in short time by transfer learning from an existing HS detector. In the experiments, we achieved about 27 times faster construction of HS detector than a conventional method, for which the accuracy is comparable.
Keyword (in Japanese) (See Japanese page) 
(in English) DFM / Lithography / Hotspot / CNN / Transfer learning / / /  
Reference Info. IEICE Tech. Rep., vol. 117, no. 455, VLD2017-106, pp. 103-108, Feb. 2018.
Paper # VLD2017-106 
Date of Issue 2018-02-21 (VLD) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF VLD2017-106

Conference Information
Committee VLD HWS  
Conference Date 2018-02-28 - 2018-03-02 
Place (in Japanese) (See Japanese page) 
Place (in English) Okinawa Seinen Kaikan 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To VLD 
Conference Code 2018-02-VLD 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Efficient Generation of Lithography Hotspot Detector based on Transfer Learning 
Sub Title (in English)  
Keyword(1) DFM  
Keyword(2) Lithography  
Keyword(3) Hotspot  
Keyword(4) CNN  
Keyword(5) Transfer learning  
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Keyword(8)  
1st Author's Name Shuhei Suzuki  
1st Author's Affiliation University of Aizu (UoA)
2nd Author's Name Yoichi Tomioka  
2nd Author's Affiliation University of Aizu (UoA)
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Speaker Author-1 
Date Time 2018-03-01 09:25:00 
Presentation Time 25 minutes 
Registration for VLD 
Paper # VLD2017-106 
Volume (vol) vol.117 
Number (no) no.455 
Page pp.103-108 
#Pages 6 
Date of Issue 2018-02-21 (VLD) 

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