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Paper Abstract and Keywords
Presentation 2019-10-24 13:50
The process technology of new piezoelectric materials BiFeO3 and dependence of substrate
Fuminobu Imaizumi, Rikuto Nakada (NIT, Oyama College) SDM2019-63
Abstract (in Japanese) (See Japanese page) 
(in English) Oxygen radical treatment was applied to sputter-deposited BiFeO3 (BFO) thin film which is expected to be used for ferroelectric memories, sensors and solar cells. The oxygen radicals were produced by a microwave excited high-density plasma. It was found from X-ray diffraction that the crystallization temperature of the BFO film could be reduced to 350 oC by applying the oxygen radical treatment before the annealing. The (110) peak area which shows the crystallinity of BFO was by 4 times than that of the BFO film annealed at 500 oC without the oxygen radical treatment. From results of XRD and X-ray photoelectron spectroscopy, the stoichiometry was dramatically improved and this suggests that the oxygen radical treatment effectively creates the nucleation cites of BiFeO3 and reduces oxygen vacancy defects.
It is important that the BiFeO3 film on DyScO3 Substrate. The lattice constant of DyScO3 (a=0.394nm) is similar to the lattice constant of BiFeO3. We developed the BiFeO3 film on the DyScO3 substrate.
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Reference Info. IEICE Tech. Rep., vol. 119, no. 239, SDM2019-63, pp. 51-54, Oct. 2019.
Paper # SDM2019-63 
Date of Issue 2019-10-16 (SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
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reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee SDM  
Conference Date 2019-10-23 - 2019-10-24 
Place (in Japanese) (See Japanese page) 
Place (in English) Niche, Tohoku Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Process Science and New Process Technology 
Paper Information
Registration To SDM 
Conference Code 2019-10-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) The process technology of new piezoelectric materials BiFeO3 and dependence of substrate 
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1st Author's Name Fuminobu Imaizumi  
1st Author's Affiliation National Institute of Technology, Oyama College (NIT, Oyama College)
2nd Author's Name Rikuto Nakada  
2nd Author's Affiliation National Institute of Technology, Oyama College (NIT, Oyama College)
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Speaker Author-1 
Date Time 2019-10-24 13:50:00 
Presentation Time 30 minutes 
Registration for SDM 
Paper # SDM2019-63 
Volume (vol) vol.119 
Number (no) no.239 
Page pp.51-54 
#Pages 4 
Date of Issue 2019-10-16 (SDM) 

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