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| Presentation | 2019-10-24 15:40 Gas concentration distribution measurement in semiconductor process chamber using a high SNR CMOS absorption image sensor Keigo Takahashi, Yhang Ricardo Sipauba Carvalho da Silva, Rihito Kuroda, Yasuyuki Fujihara, Maasa Murata, Hidekazu Ishii, Tatsuo Morimoto, Tomoyuki Suwa, Akinobu Teramoto, Shigetoshi Sugawa (Tohoku Univ.)  SDM2019-66 Link to ES Tech. Rep. Archives: SDM2019-66 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | This paper reports on gas concentration imaging using lateral overflow integration trench capacitor(LOFITreC) CMOS absorption image sensor with signal-to-noise ratio (SNR) over 70 dB and high light resistance in the ultraviolet wavelength band. Two-dimensional absorption imaging of the concentration of NO2 gas flowing in a semiconductor process chamber was experimented using the developed sensor and a 405 nm LED light source. As a result, a good calibration curve of NO2 gas was obtained, and the concentration distribution of NO2 gas flowing in a process chamber was visualized. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Spectral imaging / Concentration sensor / Absorption spectrometry / CMOS image sensor / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 119, no. 239, SDM2019-66, pp. 65-68, Oct. 2019. | |
| Paper # | SDM2019-66 | |
| Date of Issue | 2019-10-16 (SDM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | SDM2019-66 Link to ES Tech. Rep. Archives: SDM2019-66 |
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| Conference Information | |
| Committee | SDM |
| Conference Date | 2019-10-23 - 2019-10-24 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Niche, Tohoku Univ. |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Process Science and New Process Technology |
| Paper Information | |
| Registration To | SDM |
| Conference Code | 2019-10-SDM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Gas concentration distribution measurement in semiconductor process chamber using a high SNR CMOS absorption image sensor |
| Sub Title (in English) | |
| Keyword(1) | Spectral imaging |
| Keyword(2) | Concentration sensor |
| Keyword(3) | Absorption spectrometry |
| Keyword(4) | CMOS image sensor |
| Keyword(5) | |
| Keyword(6) | |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Keigo Takahashi |
| 1st Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 2nd Author's Name | Yhang Ricardo Sipauba Carvalho da Silva |
| 2nd Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 3rd Author's Name | Rihito Kuroda |
| 3rd Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 4th Author's Name | Yasuyuki Fujihara |
| 4th Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 5th Author's Name | Maasa Murata |
| 5th Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 6th Author's Name | Hidekazu Ishii |
| 6th Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 7th Author's Name | Tatsuo Morimoto |
| 7th Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 8th Author's Name | Tomoyuki Suwa |
| 8th Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 9th Author's Name | Akinobu Teramoto |
| 9th Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 10th Author's Name | Shigetoshi Sugawa |
| 10th Author's Affiliation | Tohoku University (Tohoku Univ.) |
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| Speaker | Author-1 |
| Date Time | 2019-10-24 15:40:00 |
| Presentation Time | 30 minutes |
| Registration for | SDM |
| Paper # | SDM2019-66 |
| Volume (vol) | vol.119 |
| Number (no) | no.239 |
| Page | pp.65-68 |
| #Pages | 4 |
| Date of Issue | 2019-10-16 (SDM) |
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