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| Presentation | 2019-11-15 15:45 Lithography Hotspot Detection Based on Feature Vectors Considering Wire Width and Distance Gaku Kataoka, Masato Inagi, Shinobu Nagayama, Shin'ichi Wakabayashi (Hiroshima City Univ.)  VLD2019-51 DC2019-75 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | In lithography, which is one of the semiconductor manufacturing processes, there is a pattern that is highly likely to cause an undesired short- or open-circuit, called a hotspot. Since the lithography simulation used for hotspot detection requires a very long computation time, a method to more quickly detect hotspot candidates is required. In recent years, methods using machine learning have been attracting attention as a method to more quickly detect hotspot candidates. In our previous study, we proposed methods that use feature vectors considering the distance between adjacent wires, which can be correlated with an undesired short-circuit. In this paper, we extend the previously proposed feature vectors to consider the widths of wires, which can be correlated with undesired open-circuits, and confirm its effectiveness. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | lithography / hotspot / machine-learning / classification accuracy / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 119, no. 282, VLD2019-51, pp. 185-190, Nov. 2019. | |
| Paper # | VLD2019-51 | |
| Date of Issue | 2019-11-06 (VLD, DC) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | VLD2019-51 DC2019-75 |
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| Conference Information | |
| Committee | VLD DC CPSY RECONF ICD IE IPSJ-SLDM IPSJ-EMB |
| Conference Date | 2019-11-13 - 2019-11-15 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Ehime Prefecture Gender Equality Center |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Design Gaia 2019 -New Field of VLSI Design- |
| Paper Information | |
| Registration To | VLD |
| Conference Code | 2019-11-VLD-DC-CPSY-RECONF-ICD-IE-SLDM-EMB-ARC |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Lithography Hotspot Detection Based on Feature Vectors Considering Wire Width and Distance |
| Sub Title (in English) | |
| Keyword(1) | lithography |
| Keyword(2) | hotspot |
| Keyword(3) | machine-learning |
| Keyword(4) | classification accuracy |
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| 1st Author's Name | Gaku Kataoka |
| 1st Author's Affiliation | Hiroshima City University (Hiroshima City Univ.) |
| 2nd Author's Name | Masato Inagi |
| 2nd Author's Affiliation | Hiroshima City University (Hiroshima City Univ.) |
| 3rd Author's Name | Shinobu Nagayama |
| 3rd Author's Affiliation | Hiroshima City University (Hiroshima City Univ.) |
| 4th Author's Name | Shin'ichi Wakabayashi |
| 4th Author's Affiliation | Hiroshima City University (Hiroshima City Univ.) |
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| Speaker | Author-1 |
| Date Time | 2019-11-15 15:45:00 |
| Presentation Time | 25 minutes |
| Registration for | VLD |
| Paper # | VLD2019-51, DC2019-75 |
| Volume (vol) | vol.119 |
| Number (no) | no.282(VLD), no.283(DC) |
| Page | pp.185-190 |
| #Pages | 6 |
| Date of Issue | 2019-11-06 (VLD, DC) |
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