Information: Join today and make your research activities more affordable! Technical workshop participation fees and annual registration fees are available at member rates.
Notice: [Important] Announcement of Changes to Registration Fee Payment and Manuscript Upload Procedures for IEICE Technical Meetings
IEICE Technical Committee Submission System
Conference Paper's Information		 Online Proceedings
[Sign in]
Tech. Rep. Archives
 Go Top Page Go Previous   [Japanese] / [English] 

Paper Abstract and Keywords
Presentation 2020-05-21 12:05
Plasmon Response Analysis of Thin Film Structure for Development of Magnetic Sensing
Tomohiro Tamaru, Hironori Shibagaki, Di Wu, Seiya Kishimoto, Yoshito Ashizawa, Katsuji Nakagawa, Shinichiro Ohnuki (Nihon Univ.) EST2020-5
Abstract (in Japanese) (See Japanese page) 
(in English) Electromagnetic field analysis of the Kretschmann arrangement using a mixed thin film composed of multiple metal media is performed. The optimized structure of the thin film used for the mixed medium is clarified by comparing the reflectance and plasmon excitation intensity. The magnetic sensing application of the surface plasmon sensor is examined. Assuming a thin film structure consisting of a metal for plasmon excitation and a magnetic material, we compare the reflectance and plasmon excitation intensity when the magnetic material causes a change in the dielectric constant due to external magnetic field. Since the reflection characteristics are sensitive to the change in the dielectric constant, the structure that reacts to magnetic fields is clarified.
Keyword (in Japanese) (See Japanese page) 
(in English) Magnetic sensing / Surface Plasmon Resonance / Kretschmann Arrangement / Magneto-optical effect / Finite-Difference Frequency-Domain Method / / /  
Reference Info. IEICE Tech. Rep., vol. 120, no. 31, EST2020-5, pp. 23-28, May 2020.
Paper # EST2020-5 
Date of Issue 2020-05-14 (EST) 
ISSN Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF EST2020-5

Conference Information
Committee EST  
Conference Date 2020-05-21 - 2020-05-21 
Place (in Japanese) (See Japanese page) 
Place (in English) Online 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To EST 
Conference Code 2020-05-EST 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Plasmon Response Analysis of Thin Film Structure for Development of Magnetic Sensing 
Sub Title (in English)  
Keyword(1) Magnetic sensing  
Keyword(2) Surface Plasmon Resonance  
Keyword(3) Kretschmann Arrangement  
Keyword(4) Magneto-optical effect  
Keyword(5) Finite-Difference Frequency-Domain Method  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Tomohiro Tamaru  
1st Author's Affiliation Nihon University (Nihon Univ.)
2nd Author's Name Hironori Shibagaki  
2nd Author's Affiliation Nihon University (Nihon Univ.)
3rd Author's Name Di Wu  
3rd Author's Affiliation Nihon University (Nihon Univ.)
4th Author's Name Seiya Kishimoto  
4th Author's Affiliation Nihon University (Nihon Univ.)
5th Author's Name Yoshito Ashizawa  
5th Author's Affiliation Nihon University (Nihon Univ.)
6th Author's Name Katsuji Nakagawa  
6th Author's Affiliation Nihon University (Nihon Univ.)
7th Author's Name Shinichiro Ohnuki  
7th Author's Affiliation Nihon University (Nihon Univ.)
8th Author's Name  
8th Author's Affiliation ()
9th Author's Name  
9th Author's Affiliation ()
10th Author's Name  
10th Author's Affiliation ()
11th Author's Name  
11th Author's Affiliation ()
12th Author's Name  
12th Author's Affiliation ()
13th Author's Name  
13th Author's Affiliation ()
14th Author's Name  
14th Author's Affiliation ()
15th Author's Name  
15th Author's Affiliation ()
16th Author's Name  
16th Author's Affiliation ()
17th Author's Name  
17th Author's Affiliation ()
18th Author's Name  
18th Author's Affiliation ()
19th Author's Name  
19th Author's Affiliation ()
20th Author's Name  
20th Author's Affiliation ()
21st Author's Name  
21st Author's Affiliation ()
22nd Author's Name  
22nd Author's Affiliation ()
23rd Author's Name  
23rd Author's Affiliation ()
24th Author's Name  
24th Author's Affiliation ()
25th Author's Name  
25th Author's Affiliation ()
26th Author's Name / /
26th Author's Affiliation ()
()
27th Author's Name / /
27th Author's Affiliation ()
()
28th Author's Name / /
28th Author's Affiliation ()
()
29th Author's Name / /
29th Author's Affiliation ()
()
30th Author's Name / /
30th Author's Affiliation ()
()
31st Author's Name / /
31st Author's Affiliation ()
()
32nd Author's Name / /
32nd Author's Affiliation ()
()
33rd Author's Name / /
33rd Author's Affiliation ()
()
34th Author's Name / /
34th Author's Affiliation ()
()
35th Author's Name / /
35th Author's Affiliation ()
()
36th Author's Name / /
36th Author's Affiliation ()
()
Speaker Author-2 
Date Time 2020-05-21 12:05:00 
Presentation Time 30 minutes 
Registration for EST 
Paper # EST2020-5 
Volume (vol) vol.120 
Number (no) no.31 
Page pp.23-28 
#Pages 6 
Date of Issue 2020-05-14 (EST) 

[Return to Top Page]

[Return to IEICE Web Page]
The Institute of Electronics, Information and Communication Engineers (IEICE), Japan