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Paper Abstract and Keywords
Presentation 2020-10-22 13:30
A two-step wet etching process for the integration of PdEr/HfO2 gate stack structure on the gate-first Schottky barrier MOSFET
Rengie Mark D. Mailig, Yuichiro Aruga, Shun-ichiro Ohmi (Tokyo Tech) SDM2020-17
Abstract (in Japanese) (See Japanese page) 
(in English) (Not available yet)
Keyword (in Japanese) (See Japanese page) 
(in English) / / / / / / /  
Reference Info. IEICE Tech. Rep., vol. 120, no. 205, SDM2020-17, pp. 16-19, Oct. 2020.
Paper # SDM2020-17 
Date of Issue 2020-10-15 (SDM) 
ISSN Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee SDM  
Conference Date 2020-10-22 - 2020-10-22 
Place (in Japanese) (See Japanese page) 
Place (in English) Online 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Process Science and New Process Technology 
Paper Information
Registration To SDM 
Conference Code 2020-10-SDM 
Language English 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) A two-step wet etching process for the integration of PdEr/HfO2 gate stack structure on the gate-first Schottky barrier MOSFET 
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1st Author's Name Rengie Mark D. Mailig  
1st Author's Affiliation Tokyo Institute of Technology (Tokyo Tech)
2nd Author's Name Yuichiro Aruga  
2nd Author's Affiliation Tokyo Institute of Technology (Tokyo Tech)
3rd Author's Name Shun-ichiro Ohmi  
3rd Author's Affiliation Tokyo Institute of Technology (Tokyo Tech)
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Speaker Author-1 
Date Time 2020-10-22 13:30:00 
Presentation Time 30 minutes 
Registration for SDM 
Paper # SDM2020-17 
Volume (vol) vol.120 
Number (no) no.205 
Page pp.16-19 
#Pages 4 
Date of Issue 2020-10-15 (SDM) 

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