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| Presentation | 2021-06-22 13:10 [Memorial Lecture] Modification of states of metal copper and copper oxide due to isopropyl alcohol treatment Takezo Mawaki (Tohoku Univ.), Akinobu Teramoto (Hiroshima Univ.), Katsutoshi Ishii (Tokyo Electron Technology Solutions), Yoshinobu Shiba, Tomoyuki Suwa (Tohoku Univ.), Shuji Azumo, Akira Shimizu, Kota Umezawa (Tokyo Electron Technology Solutions), Rihito Kuroda, Yasuyuki Shirai, Shigetoshi Sugawa (Tohoku Univ.)  SDM2021-22 Link to ES Tech. Rep. Archives: SDM2021-22 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | The reduction of copper oxide by isopropyl alcohol (IPA) gas and its mechanism were investigated toward the selective process of copper (Cu) wiring. The decomposition behavior of IPA gas during the IPA treatment on Cu and copper oxide surfaces was also studied. The decomposition and reaction behaviors and adsorption characteristics of IPA were investigated by the Fourier transform infrared spectroscopy (FT-IR). The chemical structures of the Cu and copper oxide surfaces before and after IPA treatment were analyzed by X-ray photoelectron spectroscopy (XPS). Based on the experiments, the process condition to induce reduction of copper oxide by IPA gas within the Cu processes temperature range was identified. In addition, the decomposition behavior of IPA gas on Cu and copper oxide surfaces was clarified. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | IPA / Cu / Reduction / Area-Selective ALD / SAMs / FT-IR / XPS / | |
| Reference Info. | IEICE Tech. Rep., vol. 121, no. 71, SDM2021-22, pp. 1-6, June 2021. | |
| Paper # | SDM2021-22 | |
| Date of Issue | 2021-06-15 (SDM) | |
| ISSN | Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | SDM2021-22 Link to ES Tech. Rep. Archives: SDM2021-22 |
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| Conference Information | |
| Committee | SDM |
| Conference Date | 2021-06-22 - 2021-06-22 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Online |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Material Science and Process Technology for MOS Devices and Memories |
| Paper Information | |
| Registration To | SDM |
| Conference Code | 2021-06-SDM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Modification of states of metal copper and copper oxide due to isopropyl alcohol treatment |
| Sub Title (in English) | |
| Keyword(1) | IPA |
| Keyword(2) | Cu |
| Keyword(3) | Reduction |
| Keyword(4) | Area-Selective ALD |
| Keyword(5) | SAMs |
| Keyword(6) | FT-IR |
| Keyword(7) | XPS |
| Keyword(8) | |
| 1st Author's Name | Takezo Mawaki |
| 1st Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 2nd Author's Name | Akinobu Teramoto |
| 2nd Author's Affiliation | Hiroshima University (Hiroshima Univ.) |
| 3rd Author's Name | Katsutoshi Ishii |
| 3rd Author's Affiliation | Tokyo Electron Technology Solutions (Tokyo Electron Technology Solutions) |
| 4th Author's Name | Yoshinobu Shiba |
| 4th Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 5th Author's Name | Tomoyuki Suwa |
| 5th Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 6th Author's Name | Shuji Azumo |
| 6th Author's Affiliation | Tokyo Electron Technology Solutions (Tokyo Electron Technology Solutions) |
| 7th Author's Name | Akira Shimizu |
| 7th Author's Affiliation | Tokyo Electron Technology Solutions (Tokyo Electron Technology Solutions) |
| 8th Author's Name | Kota Umezawa |
| 8th Author's Affiliation | Tokyo Electron Technology Solutions (Tokyo Electron Technology Solutions) |
| 9th Author's Name | Rihito Kuroda |
| 9th Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 10th Author's Name | Yasuyuki Shirai |
| 10th Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 11th Author's Name | Shigetoshi Sugawa |
| 11th Author's Affiliation | Tohoku University (Tohoku Univ.) |
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| Speaker | Author-1 |
| Date Time | 2021-06-22 13:10:00 |
| Presentation Time | 40 minutes |
| Registration for | SDM |
| Paper # | SDM2021-22 |
| Volume (vol) | vol.121 |
| Number (no) | no.71 |
| Page | pp.1-6 |
| #Pages | 6 |
| Date of Issue | 2021-06-15 (SDM) |
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