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| Presentation | 2023-06-26 13:30 [Invited Lecture] Pioneering Nondestructive Imaging of Ferroelectric Capacitors by Operando Laser-Based Photoemission Electron Microscopy Hirokazu Fujiwara, Yuki Itoya, Masaharu Kobayashi, Cedric Bareille, Shik Shin, Toshiyuki Taniuchi (Univ. of Tokyo)  SDM2023-32 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | In order to elucidate the mechanism of characteristic modulations in HfO$_2$-based ferroelectric capacitors, an in-situ electrical characterization system was implemented on a laser-based photoemission electron microscope (laser-PEEM), and we performed operando observation HfO$2$-based ferroelectric capacitors. Soft breakdown induced by cycling stress and subsequent hard breakdown were observed in-situ, and it was found that the soft breakdown extended over an area of several micrometers. Furthermore, an in-situ ferroelectric characterization system was developed by implementing a Sawyer-Tower circuit in the laser- PEEM system, and signs of changes in the electronic-state distribution associated with fatigue were observed. This result proposes a new method for observing the electronic-state distribution of functional materials and is expected to accelerate the development of device materials. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Ferroelectric device / HfO2 / Photoemission electron microscopy / Operando observation / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 123, no. 89, SDM2023-32, pp. 19-22, June 2023. | |
| Paper # | SDM2023-32 | |
| Date of Issue | 2023-06-19 (SDM) | |
| ISSN | Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | SDM2023-32 |
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| Conference Information | |
| Committee | SDM |
| Conference Date | 2023-06-26 - 2023-06-26 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Hiroshima Univ. (Res. Inst. of Nanodevices) |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Material Science and Process Technology for MOS Devices, Memories, and Power Devices |
| Paper Information | |
| Registration To | SDM |
| Conference Code | 2023-06-SDM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Pioneering Nondestructive Imaging of Ferroelectric Capacitors by Operando Laser-Based Photoemission Electron Microscopy |
| Sub Title (in English) | |
| Keyword(1) | Ferroelectric device |
| Keyword(2) | HfO2 |
| Keyword(3) | Photoemission electron microscopy |
| Keyword(4) | Operando observation |
| Keyword(5) | |
| Keyword(6) | |
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| Keyword(8) | |
| 1st Author's Name | Hirokazu Fujiwara |
| 1st Author's Affiliation | University of Tokyo (Univ. of Tokyo) |
| 2nd Author's Name | Yuki Itoya |
| 2nd Author's Affiliation | University of Tokyo (Univ. of Tokyo) |
| 3rd Author's Name | Masaharu Kobayashi |
| 3rd Author's Affiliation | University of Tokyo (Univ. of Tokyo) |
| 4th Author's Name | Cedric Bareille |
| 4th Author's Affiliation | University of Tokyo (Univ. of Tokyo) |
| 5th Author's Name | Shik Shin |
| 5th Author's Affiliation | University of Tokyo (Univ. of Tokyo) |
| 6th Author's Name | Toshiyuki Taniuchi |
| 6th Author's Affiliation | University of Tokyo (Univ. of Tokyo) |
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| Speaker | Author-1 |
| Date Time | 2023-06-26 13:30:00 |
| Presentation Time | 40 minutes |
| Registration for | SDM |
| Paper # | SDM2023-32 |
| Volume (vol) | vol.123 |
| Number (no) | no.89 |
| Page | pp.19-22 |
| #Pages | 4 |
| Date of Issue | 2023-06-19 (SDM) |
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