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Chair |
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Takahiro Shinada (Tohoku Univ.) |
Vice Chair |
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Hiroshige Hirano (TowerJazz Panasonic) |
Secretary |
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Hiroya Ikeda (Shizuoka Univ.), Tetsu Morooka (KIOXIA) |
Assistant |
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Takahiro Mori (AIST), Nobuaki Kobayashi (Nihon Univ.) |
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Chair |
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Yutaka Majima (Tokyo Inst. of Tech.) |
Vice Chair |
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Toshiki Yamada (NICT) |
Secretary |
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Dai Taguchi (Tokyo Inst. of Tech.), Hirotake Kajii (Osaka Univ.) |
Assistant |
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Toshihiko Kaji (Tokyo Univ. of Agriculture and Tech.), Yoshiyuki Seike (Aichi Inst. of Tech.) |
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Conference Date |
Mon, Apr 13, 2020 13:00 - 17:40
Tue, Apr 14, 2020 09:10 - 11:40 |
Topics |
Thin film devices (Si, compound, organic, flexible), Biotechnology, Materials, Characterization, etc. |
Conference Place |
Okinawa Seinen Kaikan |
Address |
2-15-23 Kume, Naha-shi, Okinawa 900-0033, Japan |
Contact Person |
Taizoh SADOH (Kyushu University) |
Announcement |
This workshop has been cancelled. The technical report will not be issued. |
Registration Fee |
This workshop will be held as the IEICE workshop in fully electronic publishing. Registration fee will be necessary except the speakers and participants other than the participants to workshop(s) in non-electronic publishing. See the registration fee page. We request the registration fee or presentation fee to participants who will attend the workshop(s) on SDM, OME. |
Mon, Apr 13 PM 13:00 - 17:40 |
(1) |
13:00-13:30 |
[Invited Talk]
Twin formation mechanism in growth of single crystal Si strip by uCLBS method and influence of precursor Si films |
Wenchang Yeh, Toshiki Shirakawa (Shimane Univ.) |
(2) |
13:30-14:00 |
[Invited Talk]
Low-Temperature Crystallization of Group Four Semiconductor Thin Film and Thin-Film Transistor Utilizing Tunnel Injection |
Naoto Matsuo (Univ Hyogo) |
(3) |
14:00-14:20 |
Metal Source/Drain Structure TFTs using poly-Si Crystallized by Blue Multi-Laser Diode Annealing |
Tatsuya Okada, Takashi Noguchi (Univ. Ryukyus) |
(4) |
14:20-14:50 |
[Invited Talk]
Low temperature crystallization of silicon thin film and its application to thin film transistor |
Yukiharu Uraoka (NAIST) |
(5) |
14:50-15:10 |
Issues for crystallization of SI films |
Noguchi Takashi, Okada Tatsuya (Univ. Ryukyus) |
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15:10-15:20 |
Break ( 10 min. ) |
(6) |
15:20-15:50 |
[Invited Talk]
Transistor application of polycrystalline Ge-based thin films |
Kaoru Toko (Univ. of Tsukuba) |
(7) |
15:50-16:20 |
[Invited Talk]
Atmospheric Pressure Thermal Plasma Jet Crystallization and Electrical Characteristics of Phosphorus-doped Germanium Films on Insulator |
Seiichiro Higashi (Hiroshima Univ.) |
(8) |
16:20-16:50 |
[Invited Talk]
Improving the characteristics of graphene TFT using graphene/Ni compound semiconductor hetero-junction |
Kazunori Ichikawa (NIT Matsue Col) |
(9) |
16:50-17:20 |
[Invited Talk]
Fabrication of MoS2 and WS2 films by chemical solution process for thin film transistors |
Joonam Kim, Takahiro Nakajima, Yuki Kobayashi, Ken-ichi Haga, Eisuke Tokumitsu (JAIST) |
(10) |
17:20-17:40 |
Effects of a-Si under-layer on solid-phase crystallization of GeSn/insulator |
Yuta Tan, Daiki Tsuruta, Taizoh Sadoh (Kyushu univ.) |
Tue, Apr 14 AM 09:10 - 11:40 |
(11) |
09:10-09:30 |
In situ observation of molecules adsorbed on solid/liquid interfaces |
Naoki Matsuda, Hirotaka Okabe (AIST) |
(12) |
09:30-09:50 |
EFISHG measurement system for study of triboelectric generation and visualizing electronic charge due to triboelectrification and peeling-electrification |
Dai Taguchi, Takaaki Manaka, Mitsumasa Iwamoto (Tokyo Tech) |
(13) |
09:50-10:10 |
Analysis of polarization mechanism of chiral perovskites using nonlinear optical measurement |
Taishi Noma (RIKEN) |
(14) |
10:10-10:40 |
[Invited Talk]
TFT LCD displays and it related glass substratge attributes |
Taketsugu Itoh (IDC) |
(15) |
10:40-11:10 |
[Invited Talk]
Oxide vs. poly-Si TFTs |
Mamoru Furuta (KUT) |
(16) |
11:10-11:40 |
[Invited Talk]
Development of oxide thin-film transistors for large-sized flexible displays |
Hiroshi Tsuji, Mitsuru Nakata, Tatsuya Takei, Masashi Miyakawa, Yoshiki Nakajima, Takahisa Shimizu (NHK) |
Announcement for Speakers |
General Talk (20) | Each speech will have 15 minutes for presentation and 5 minutes for discussion. |
Invited Talk (35) | Each speech will have 25 minutes for presentation and 10 minutes for discussion. |
Contact Address and Latest Schedule Information |
SDM |
Technical Committee on Silicon Device and Materials (SDM) [Latest Schedule]
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Contact Address |
Tetsu Morooka(KIOXIA Corp.)
Tel 059-390-7451 Fax 059-361-2739
E-: oxia |
OME |
Technical Committee on Organic Molecular Electronics (OME) [Latest Schedule]
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Contact Address |
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Last modified: 2020-03-02 13:41:18
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