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All Technical Committee Conferences (Searched in: All Years)
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| Search Results: Conference Papers |
| Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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| Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
| ICD, SDM |
2005-08-19
11:10 |
Hokkaido |
HAKODATE KOKUSAI HOTEL |
Improvement of threshold voltage asymmetry by Al compositional mudulation and partially silicided gate electrode for Hf-based high-k CMOSFETs
Masaru Kadoshima, Arito Ogawa, Masashi Takahashi (MIRAI-ASET), Hiroyuki Ota (MIRAI-ASRC, AIST), Nobuyuki Mise, Kunihiko Iwamoto (MIRAI-ASET), Shinji Migita (MIRAI-ASRC, AIST), Hideaki Fujiwara, Hideki Satake, Toshihide Nabatame (MIRAI-ASET), Akira Toriumi (MIRAI-ASRC, AIST, The Univ. of Tokyo) |
Threshold voltage (Vth) tuning by engineering Fermi-level pinning (FLP) on HfAlOx(N) dielectrics is demonstrated for CMO... [more] |
SDM2005-148 ICD2005-87
pp.31-36 |
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