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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
MRIS, ITE-MMS |
2021-12-10 15:35 |
Online |
Online |
Development of flux control writer
-- World's first practical use of assist record technology -- Naoyuki Narita, Masayuki Takagishi (Toshiba corporate R&D center), Gaku Koiizumi, Akihiko Takeo (Toshiba devices & storage corporation), Tomoyuki Maeda (Toshiba corporate R&D center) |
[more] |
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MRIS, ITE-MMS |
2020-12-03 14:30 |
Online |
Online |
[Invited Talk]
Extended Concept of MAMR and Its Performance and Reliability Akihiko Takeo, Gaku Koizumi, Naoyuki Narita, Masayuki Takagishi, Tomoyuki Maeda (Toshiba) MRIS2020-8 |
[more] |
MRIS2020-8 pp.14-19 |
MRIS, ITE-MMS |
2012-10-19 08:55 |
Akita |
AIT |
[Invited Talk]
5Tb/in2 Bit Patterned Media Fabricated by a Directed Self-Assembling Polymer Mask Yoshiyuki Kamata, Tomoyuki Maeda, Hiroyuki Hieda, Ryosuke Yamamoto, Naoko Kihara, Akira Kikitsu (Toshiba corp.) MR2012-25 |
FePt bit patterned media (BPM) was fabricated with a self-assembled polymer mask with 12 nm pitch (equivalent to 5 Tdot/... [more] |
MR2012-25 pp.43-48 |
MRIS, ITE-MMS |
2009-07-16 15:20 |
Tokyo |
Tokyo Inst. of Tech. |
Etching damage analysis of patterned media using the Grazing Incidence X-ray Reflectively technique Satoshi Shirotori, Yoshiyuki Kamata, Tomoyuki Maeda, Kazuto Kashiwagi, Yosuke Isowaki, Akira Kikitsu (Toshiba Corp.) MR2009-17 |
A Co/Pt patterned medium was fabricated by an Ar ion etching process through a self-assembled polymer mask with a diamet... [more] |
MR2009-17 pp.25-30 |
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