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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
ICD, SDM |
2008-07-18 15:30 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
High Performance Sub-35 nm Bulk CMOS with Hybrid Gate Structures of NMOS; Dopant Confinement Layer (DCL) / PMOS; Ni-FUSI by Using Flash Lamp Anneal (FLA) in Ni-Silicidation
-- Hybrid Gate Structures -- Hiroyuki Ohta (Fujitsu Lab.), Kazuo Kawamura (FML), Hidenobu Fukutome (Fujitsu Lab.), Mitsugu Tajima, Ken-ichi Okabe (FML), Keiji Ikeda, Kimihiko Hosaka, Yoichi Momiyama, Shigeo Satoh, Toshihiro Sugii (Fujitsu Lab.) SDM2008-148 ICD2008-58 |
We applied Flash Lamp Annealing (FLA) in Ni-silicidation to our developed Dopant Confinement Layer (DCL) structure for t... [more] |
SDM2008-148 ICD2008-58 pp.115-120 |
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