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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
CPM, LQE, ED |
2019-11-21 13:20 |
Shizuoka |
Shizuoka Univ. (Hamamatsu) |
Characterization of plasma-induced damage of GaN trench sidewall formed by ICP-RIE Shinji Yamada, Hideki Sakurai (Nagoya Univ./ULVAC), Yamato Osada, Toshiyuki Nakamura, Ryuichiro Kamimura (ULVAC), Jun Suda, Tetsu Kachi (Nagoya Univ.) ED2019-40 CPM2019-59 LQE2019-83 |
(To be available after the conference date) [more] |
ED2019-40 CPM2019-59 LQE2019-83 pp.33-35 |
WPT, EE (Joint) |
2018-10-03 09:55 |
Kyoto |
Kyoto Univ. Uji Campus |
GaN diode rectifier with recessed gate FET for wireless power transfer Jumpei Sumino, Yuya Ikedo (NITech), Yamato Osada, Ryuichiro Kamimura (ULVAC), Akio Wakejima (NITech) WPT2018-30 |
(To be available after the conference date) [more] |
WPT2018-30 pp.5-9 |
LQE, CPM, ED |
2017-12-01 10:55 |
Aichi |
Nagoya Inst. tech. |
Achievement of AlGaN deep-UV LED using photonic crystal(PhC)
-- Achievement of high-EQE(10%) AlGaN deep-UV LED using highly-reflective PhC on p-contact layer -- Yukio Kashima (Marubun), Noritoshi Maeda (RIKEN), Eriko Matsuura (Marubun), Masafumi Jo (RIKEN), Takeshi Iwai, Toshiro Morita (TOK), Mitsunori Kokubo, Takaharu Tashiro (TOSHIBA MACHINE), Ryuichiro Kamimura, Yamato Osada (ULVAC), Yuichi Kurashima, Hideki Takagi (AIST), Hideki Hirayama (RIKEN) ED2017-60 CPM2017-103 LQE2017-73 |
[more] |
ED2017-60 CPM2017-103 LQE2017-73 pp.55-60 |
LQE, ED, CPM |
2014-11-27 14:05 |
Osaka |
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The micro machining process technology of nano imprint and dry etching to improve the efficiency of nitride LED Yukio Kashima, Eriko Matsuura (Marubun), Satoshi Shimatani (TOK), Mitsunori Kokubo, Takaharu Tashiro, Takafumi Ookawa (Toshiba Machine), Ryuichiro Kamimura, Yamato Osada (ULVAC), Sachie Fujikawa, Hideki Hirayama (RIKEN) ED2014-79 CPM2014-136 LQE2014-107 |
We fabricated the photonic crystal in nitride LED and improved the light extraction efficiency. We also introduce the mi... [more] |
ED2014-79 CPM2014-136 LQE2014-107 pp.27-32 |
LQE, ED, CPM |
2014-11-27 14:55 |
Osaka |
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Fabrication of high-quality AlN buffer layer for deep-UV LEDs grown on wet chemical etched patterned sapphire substrate Yuya Kanazawa, Shiro Toyoda, Issei Ohshima (Saitama Univ./RIKEN), Norihiko Kamata (Saitama Univ.), Yukio Kashima (Marubun), Eriko Matsuura (MARUBUN), Satoshi Shimatani (TOK), Mitsunori Kokubo, Takaharu Tashiro (TOSHIBA MACHINE), Takashi Ohkawa, Ryuichiro Kamimura, Yamato Osada (ULVAC), Hideki Hirayama (RIKEN) ED2014-81 CPM2014-138 LQE2014-109 |
[more] |
ED2014-81 CPM2014-138 LQE2014-109 pp.39-44 |
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