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SDM 2020-11-20
13:30		 Online Online [Invited Talk] Analyses of CVD/ALD thin film deposition mechanism by reactive molecular dynamics simulation and quantum chemical calculation
Takashi Tokumasu, Naoya Uene, Takuya Mabuchi (Tohoku Univ.), Masaru Zaitsu, Shigeo Yasuhara (JAC) SDM2020-31		  [more] SDM2020-31
pp.41-46
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