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Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM 2007-11-16
15:35		 Niigata Nagaoka University of Technology Temperature Coefficient Resistance of NiCr Film Resistor with ZrO2 Buffer Layer Deposited by Gas Flow Sputtering
Satoshi Iwatsubo (Toyama Industrial Tech. Ctr.) CPM2007-110		 The property of temperature coefficient of resistance (TCR) of NiCr film resistor with buffer layer of ZrO2 was investig... [more] CPM2007-110
pp.29-34
CPM 2006-11-10
11:40		 Ishikawa Kanazawa Univ. Effect of Surface Roughness of Substrate on Structure and Temperature Coefficient of Resistance (TCR) of NiCr Films Deposited by Sputtering
Satoshi Iwatsubo, Takaaki Shimizu (Toyama Ind. Tech. Ctr.) 		 [more] CPM2006-128
pp.87-92
CPM 2005-11-11
13:30		 Fukui   Thermal Strain and Temperature Coefficient of Resistance (TCR) of NiCr Thin Films Deposited by Sputtering
Satoshi Iwatsubo, Takaaki Shimizu (Toyama Industrial Techonogy Center), Ken Tsubata, Daisuke Kuwahara (HDK), Katsumi Tanino (Toyama Industrial Techonogy Center) 		Temperature Coefficient of Resistance (TCR) is an important property for the film resistance. So far, the factor mainly ... [more] CPM2005-152
pp.1-6
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