Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380
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CPM2008-41
Development of Surface-Wave Plasma Generation Apparatus and Application to Semiconductor Processing
Hisashi Fukuda (Muroran Inst. Technol.), Masakazu Furukawa (ARIC)
pp. 1 - 4
CPM2008-42
Field Emission Characteristics of Sputter Deposited Carbon Films
Kei Miyazaki, Yoshiyuki Taguchi, Hirofumi Saito, Takuya Miyanaga, Tomohiko Yamakami, Rinpei Hayashibe, Kiichi Kamimura (Shinshu Univ.)
pp. 5 - 8
CPM2008-43
Preparation of Mg-Ni thin films by Alternation Layer Deposition Method
Hidehiko Shimizu, Makoto Hirata, Tomohiro Okada, Haruo Iwano, Takahiro Kawakami (Niigata Univ.)
pp. 9 - 14
CPM2008-44
Organic Thin Film Transistor with Substituted Polyacetylenes containing Hetero Atoms
Tetsuya Imamura, Yasuteru Mawatari, Hisashi Fukuda, Masayoshi Tabata (Muroran Inst. Technol)
pp. 15 - 18
CPM2008-45
Poly-3-hexylthiophene Thin Film Formation and Application to Organic Thin Film Transistor
Hisashi Fukuda, Katsuhiro Uesugi (Muroran Inst. Technol.)
pp. 19 - 22
CPM2008-46
Pentacene Thin Film Formation and Application to Organic Transistor
Yoshihiro Tada, Shinya Yamada, Katsuhiro Uesugi, Hisashi Fukuda (Muroran Inst. Technol.)
pp. 23 - 26
Note: Each article is a technical report without peer review, and its polished version will be published elsewhere.