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Paper Abstract and Keywords
Presentation 2008-08-04 14:25
Field Emission Characteristics of Sputter Deposited Carbon Films
Kei Miyazaki, Yoshiyuki Taguchi, Hirofumi Saito, Takuya Miyanaga, Tomohiko Yamakami, Rinpei Hayashibe, Kiichi Kamimura (Shinshu Univ.) CPM2008-42
Abstract (in Japanese) (See Japanese page) 
(in English) The field emission characteristics of sputter deposited carbon films were measured and discussed. The low threshold field was obtained in the field emission characteristics of the sample deposited under rather high sputtering pressure of about 150 mTorr. The emission current saturated at high field region. The one of the reasons of this phenomenon was found to be field re-distribution caused by potential drop resulted from series resistance of current paths.
Keyword (in Japanese) (See Japanese page) 
(in English) field emission / carbon film / series resistanc / sputtering / / / /  
Reference Info. IEICE Tech. Rep., vol. 108, no. 178, CPM2008-42, pp. 5-8, Aug. 2008.
Paper # CPM2008-42 
Date of Issue 2008-07-28 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee CPM  
Conference Date 2008-08-04 - 2008-08-04 
Place (in Japanese) (See Japanese page) 
Place (in English) Muroran Institute of Technology 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Electronic Component Parts and Materials, etc. 
Paper Information
Registration To CPM 
Conference Code 2008-08-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Field Emission Characteristics of Sputter Deposited Carbon Films 
Sub Title (in English)  
Keyword(1) field emission  
Keyword(2) carbon film  
Keyword(3) series resistanc  
Keyword(4) sputtering  
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1st Author's Name Kei Miyazaki  
1st Author's Affiliation Shinshu University (Shinshu Univ.)
2nd Author's Name Yoshiyuki Taguchi  
2nd Author's Affiliation Shinshu University (Shinshu Univ.)
3rd Author's Name Hirofumi Saito  
3rd Author's Affiliation Shinshu University (Shinshu Univ.)
4th Author's Name Takuya Miyanaga  
4th Author's Affiliation Shinshu University (Shinshu Univ.)
5th Author's Name Tomohiko Yamakami  
5th Author's Affiliation Shinshu University (Shinshu Univ.)
6th Author's Name Rinpei Hayashibe  
6th Author's Affiliation Shinshu University (Shinshu Univ.)
7th Author's Name Kiichi Kamimura  
7th Author's Affiliation Shinshu University (Shinshu Univ.)
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Speaker Author-1 
Date Time 2008-08-04 14:25:00 
Presentation Time 25 minutes 
Registration for CPM 
Paper # CPM2008-42 
Volume (vol) vol.108 
Number (no) no.178 
Page pp.5-8 
#Pages 4 
Date of Issue 2008-07-28 (CPM) 

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