IEICE Technical Report

Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380

Electromechanical Devices

Workshop Date : 2011-06-30 / Issue Date : 2011-06-23

EMD2011-8
Magnetic Pulse Welding of Copper Foils on Flexible Print Circuit without Using Driver
Tomokatsu Aizawa (Tokyo Metropolitan College)
pp. 1 - 4

EMD2011-9
Formation and Shape Control of Oxide Nanostrutures by CVD and Solution Growth Techniques
Tomoaki Terasako, Tetsuro Fujiwara, Kohei Takegawa, Sho Shirakata (Ehime Univ.)
pp. 5 - 10

EMD2011-10
Electrical properties of ZnO films grown on sapphire substrates using high-energy H2O generated by a catalytic reaction
Souichi Satomoto, Masami Tahara, Hitoshi Miura, Takahiro Kato, Kanji Yasui (Nagaoka Univ. Technol.)
pp. 11 - 16

EMD2011-11
Electrical Property Improvement by Inserting a Buffer Layer in Impurity-Doped ZnO Transparent Electrodes Prepared by Magnetron Sputtering Depositions
Jun-ichi Nomoto, Tomoyasu Hirano, Toshihiro Miyata, Tadatsugu Minami (Kanazawa Inst. of Tech.)
pp. 17 - 21

EMD2011-12
[Invited Talk] Properties of Transient EL in Phosphorescent Organic Light-Emitting Diodes
Hirotake Kajii, Yutaka Ohmori (Osaka Univ.)
pp. 23 - 27

EMD2011-13
Preparation of Transparent Conducting AZO Thin Films for Thin-Film Solar Cell Applications by Magnetron Sputtering Depositions
Tomoyasu Hirano, Jun-ichi Nomoto, Toshihiro Miyata, Tadatsugu Minami (Kanazawa Inst. of Tech.)
pp. 29 - 33

EMD2011-14
Fabrication of high-efficiency ZnO/Cu2O heterojunction solar cells
Yuki Nishi, Yuusuke Noguchi, Toshihiro Miyata, Tadatsugu Minami (Kanazawa Inst. of Tech.)
pp. 35 - 39

EMD2011-15
Adhesion Improvement of Fluoropolymer Thin Films by Ion-Assisted Vapor Deposition Polymerization
Kazuo Senda, Tsuyoshi Matsuda, Kuniaki Tanaka, Hiroaki Usui (Tokyo Univ. Agricul. & Technol.)
pp. 41 - 46

EMD2011-16
Studying carrier behavior in solution processed TIPS pentacene FET using TRM-SHG
Takaaki Manaka, Yusuke Shibata, Mitsumasa Iwamoto (Tokyo Tech.)
pp. 47 - 52

EMD2011-17
EL and PL Characteristics in Various Bi-activated Vanadate-based Phosphor Thin Films
Toshihiro Miyata, Tadatsugu Minami (Kanazawa Inst. of Tech.)
pp. 53 - 57

EMD2011-18
Properties of AZO Thin Films Deposited at Room temperature by Low Voltage Sputtering Method
Jun Kashiide, Katsuhito Nagoshi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Kotaro Nagata, Yasuo Fukushima, Nozomu Tsuboi, Takahiro Nomoto (Niigata Univ.)
pp. 59 - 63

EMD2011-19
Properties of MgTiO3 doped KNbO3 ceramics
Akimichi Shimizu, Kenta Owada, Noriko Bamba (Shinshu Univ.)
pp. 65 - 70

Note: Each article is a technical report without peer review, and its polished version will be published elsewhere.

The Institute of Electronics, Information and Communication Engineers (IEICE), Japan