Paper Abstract and Keywords |
Presentation |
2011-06-30 15:30
Adhesion Improvement of Fluoropolymer Thin Films by Ion-Assisted Vapor Deposition Polymerization Kazuo Senda, Tsuyoshi Matsuda, Kuniaki Tanaka, Hiroaki Usui (Tokyo Univ. Agricul. & Technol.) EMD2011-15 CPM2011-51 OME2011-29 Link to ES Tech. Rep. Archives: EMD2011-15 CPM2011-51 OME2011-29 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
A novel dry process for depositing fluoropolymer thin film was developed by vapor deposition polymerization under the assistance by ion irradiation. The ion irradiation is effective in removing the impurities on the substrate surface. Moreover, it enables smoothening, chemical activation and physical treatment of the substrate surface. As a consequence, highly uniform fluoropolymer thin films with excellent adhesion were obtained. Their adhesion strength was compared to those fluoropolymer films that were prepared by the spin-coating method. Moreover, the ion-assisted deposition polymerization was capable of controlling the film characteristics by adjusting the ion acceleration voltage. The deposited films have low refractive index, which makes them attractive as the antireflective coating. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
ion-assisted deposition / deposition polymerization / fluoropolymer / fluorinated alkylacrylate / antireflective coating / surface treatment / adhesion strength / |
Reference Info. |
IEICE Tech. Rep., vol. 111, no. 110, OME2011-29, pp. 41-46, June 2011. |
Paper # |
OME2011-29 |
Date of Issue |
2011-06-23 (EMD, CPM, OME) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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EMD2011-15 CPM2011-51 OME2011-29 Link to ES Tech. Rep. Archives: EMD2011-15 CPM2011-51 OME2011-29 |
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