Online edition: ISSN 2432-6380
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ED2026-15
[Invited Talk]
Unlocking the Nanoscale: Size Effects in Transparent Conducting Oxides
-- Controlling Carrier Transport Below the 10 nm Thickness Threshold --
Tetsuya Yamamoto (KUT)
pp. 1 - 4
ED2026-16
The relationship between annealing conditions and localized surface plasmon resonance wavelength of silver thin films made by mist CVD
Kei Mizumoto, Ryosuke Ohashi, Htet Su Wai, Sohaib Hassan (Kochi Univ. of Tech, School of Sys. Eng), Toshiyuki Kawaharamura (Kochi Univ. of Tech, Res. Inst)
pp. 5 - 6
ED2026-17
Nanometer-thick oxide semiconductor thin film transistors and its sensor application
Fumihiko Hirose (Yamagata Univ.)
pp. 7 - 9
ED2026-18
Investigation of Deposition Conditions for growing Cu₂O Thin Films by Mist CVD
Ryosuke Ohashi, Chiaki Watanabe, Ryoma Yoshida, Kei Mizumoto, Sohaib Hassan, Hetet Su Wai, Toshiyuki Kawaharamura (KUT.)
pp. 10 - 11
ED2026-19
Challenge toward the fabrication of delafossite type PdCoO₂ thin films by mist
Ryoma Yoshida, Ryosuke Oohashi, Kei Mizumoto, Yuuya Morioka, Htet Su Wai, Liu Kun, Sohaib Hassan, Toshiyuki Kawaharamura (KUT)
pp. 12 - 13
ED2026-20
Electrical Properties of Ga2O3 CAVETs Fabricated by Hot Implantation
Jun Morihara (Osaka Metropolitan Univ.), Daisuke Matsuo, Shun Konno, Kosuke Usui, Shinya Takemura (Nissin Ion Equipment), Zhenwei Wang (NICT), Romualdo A. Ferreyra (Osaka Metropolitan Univ.), Junya Yoshinaga (Nippon Sanso Corp.), Yoshiki Iba, Yuma Terauchi (Tokyu Univ. of Agric. and Tech,), Kohei Tanaka (Nissin Ion Equipment), Yoshinao Kumagai (Tokyu Univ. of Agric. and Tech,), Masataka Higashiwaki (Osaka Metropolitan Univ.)
pp. 14 - 17
ED2026-21
Electrical Characteristics and Interface State Density of Ga2O3 MOS Capacitors With Si-Implanted AlOx Insulators
Keita Shoji (Osaka Metropolitan Univ.), Daisuke Matsuo, Shun Konno, Kosuke Usui, Kohei Tanaka (NIC), Masataka Higashiwaki (Osaka Metropolitan Univ.)
pp. 18 - 21
ED2026-22
Deposition Process and UV Detection Properties of Gallium Oxide Thin Films Prepared by Chemical Solution Deposition
Masatoshi Koyama, Yuki Nakano, Shunsuke Enoki, Sora Nakashima, Kazuto Koike, Akihiko Fujii, Toshihiko Maemoto (Osaka Inst. Tech.)
pp. 22 - 25
ED2026-23
Characterization of IGZO thin films fabricated by mist CVD with different precursor compositions
Chiaki Watanabe, Ryosuke Ohashi, Sohaib Hassan, Htet Su Wai, Toshiyuki Kawaharamura (Kochi Univ. of Tech.)
pp. 26 - 27
ED2026-24
Crystal Phases of (InxGa1-x)2O3 Synthesized in the Mist Reaction Field
Toshiyuki Kawaharamura, Sohaib Hassan, Abhay Kumar Mondal, Kun Liu, Htet Su Wai (Kochi Univ. of Tech.)
pp. 28 - 29
Note: Each article is a technical report without peer review, and its polished version will be published elsewhere.