| Paper Abstract and Keywords |
| Presentation |
2006-06-22 10:30
Analysis of nitrogen depth profile in SiO2/SiN stacks studied by angle-resolved photoemission spectroscopy
Satoshi Toyoda, Jun Okabayashi, Masaharu Oshima (Tokyo Univ.), Guo-Lin Liu, Ziyuan Liu, Kazuto Ikeda, Koji Usuda (STARC) |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
Nitrogen in-depth profile and chemical states in Si oxynitride films are important to understand characteristics of the transistors and structure of the gate insulators. Angle-resolved photoelectron spectroscopy is widely utilized to probe the chemical states and the atomic concentration along the depth in thin films. However, it is generally difficult to perform quantitative analysis because the depth profile strongly depends on analytical methods for the intensity of the photoelectron spectra. We have developed a new program based on the maximum-entropy method for quantitative analysis of nitrogen in-depth profile and applied for experimental data. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
angle-resolved photoelectron spectroscopy / maximum-entropy method / in-depth profile / chemical states / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 106, no. 108, SDM2006-55, pp. 77-80, June 2006. |
| Paper # |
SDM2006-55 |
| Date of Issue |
2006-06-14 (SDM) |
| ISSN |
Print edition: ISSN 0913-5685 |
| Download PDF |
|
| Conference Information |
| Committee |
SDM |
| Conference Date |
2006-06-21 - 2006-06-22 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Faculty Club, Hiroshima Univ. |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
Science and Technologies of Dielectric Thin Films for Future Electron Devices |
| Paper Information |
| Registration To |
SDM |
| Conference Code |
2006-06-SDM |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Analysis of nitrogen depth profile in SiO2/SiN stacks studied by angle-resolved photoemission spectroscopy |
| Sub Title (in English) |
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| Keyword(1) |
angle-resolved photoelectron spectroscopy |
| Keyword(2) |
maximum-entropy method |
| Keyword(3) |
in-depth profile |
| Keyword(4) |
chemical states |
| Keyword(5) |
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| Keyword(6) |
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| 1st Author's Name |
Satoshi Toyoda |
| 1st Author's Affiliation |
The University of Tokyo (Tokyo Univ.) |
| 2nd Author's Name |
Jun Okabayashi |
| 2nd Author's Affiliation |
The University of Tokyo (Tokyo Univ.) |
| 3rd Author's Name |
Masaharu Oshima |
| 3rd Author's Affiliation |
The University of Tokyo (Tokyo Univ.) |
| 4th Author's Name |
Guo-Lin Liu |
| 4th Author's Affiliation |
Semiconductor Technology Academic Research Center (STARC) |
| 5th Author's Name |
Ziyuan Liu |
| 5th Author's Affiliation |
Semiconductor Technology Academic Research Center (STARC) |
| 6th Author's Name |
Kazuto Ikeda |
| 6th Author's Affiliation |
Semiconductor Technology Academic Research Center (STARC) |
| 7th Author's Name |
Koji Usuda |
| 7th Author's Affiliation |
Semiconductor Technology Academic Research Center (STARC) |
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| Speaker |
Author-1 |
| Date Time |
2006-06-22 10:30:00 |
| Presentation Time |
25 minutes |
| Registration for |
SDM |
| Paper # |
SDM2006-55 |
| Volume (vol) |
vol.106 |
| Number (no) |
no.108 |
| Page |
pp.77-80 |
| #Pages |
4 |
| Date of Issue |
2006-06-14 (SDM) |