Paper Abstract and Keywords |
Presentation |
2006-08-03 16:30
TFT-controlled FED Masayoshi Nagao, Chiaki Yasumuro, Yuuichi Sakamura, Seigo Kanemaru, Junji Itoh (AIST) Link to ES Tech. Rep. Archives: ED2006-126 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Thin-film transistor-controlled field-emission display (TFT-controlled FED) was fabricated. Each pixel of the FED has field emitter array (FEA) and a thin-film transistor (TFT) as a control device of FEA. We adopted a multi-gate and lightly-doped drain structured poly-Si TFT for the emission control device. We also adopted amorphous Si FEA with HfC coating for each pixel. Precise control of the emission current by the built-in poly-Si TFT was demonstrated in vacuum chamber. We also developed new packaging method for FED in which sealing of glass panel was performed in vacuum chamber. This method has an advantage of damage free packaging of emitting device. The emission life time of the HfC-coated FEA was measured in the sealed vacuum envelope. More than 2500 hrs of continuous emission without degradation was confirmed. Active matrix device we fabricated is sealed in vacuum envelope using the new method, that is TFT-controlled FED, and its operation was confirmed. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
vacuum nanoelectronics / field emission display / thin film transistor / hafnium carbide / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 106, no. 200, ED2006-126, pp. 47-52, Aug. 2006. |
Paper # |
ED2006-126 |
Date of Issue |
2006-07-27 (ED) |
ISSN |
Print edition: ISSN 0913-5685 |
Copyright and reproduction |
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Link to ES Tech. Rep. Archives: ED2006-126 |