Paper Abstract and Keywords |
Presentation |
2006-09-26 10:25
To be announced Yoshio Ashizawa, Hideki Oka (FUJITSU LABORATORIES) Link to ES Tech. Rep. Archives: SDM2006-161 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
The density gradient approach is presented to device characteristics analysis with random dopant fluctuations. We investigate the basic characteristics for charge assignment and effective mobility to introduce density gradient approach into 3D atomistic device simulation. We demonstrate the resolution for electrostatic impurity scattering with SG SOI device structure. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Random Discrete Dopant / Density Gradient / Discretization Error / Atomistic / Sano Model / / / |
Reference Info. |
IEICE Tech. Rep., vol. 106, no. 256, SDM2006-161, pp. 7-12, Sept. 2006. |
Paper # |
SDM2006-161 |
Date of Issue |
2006-09-18 (VLD, SDM) |
ISSN |
Print edition: ISSN 0913-5685 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
Link to ES Tech. Rep. Archives: SDM2006-161 |
Conference Information |
Committee |
SDM VLD |
Conference Date |
2006-09-25 - 2006-09-26 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Kikai-Shinko-Kaikan Bldg. |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Process, Device, Circuit Simulation, etc. |
Paper Information |
Registration To |
SDM |
Conference Code |
2006-09-SDM-VLD |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
To be announced |
Sub Title (in English) |
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Keyword(1) |
Random Discrete Dopant |
Keyword(2) |
Density Gradient |
Keyword(3) |
Discretization Error |
Keyword(4) |
Atomistic |
Keyword(5) |
Sano Model |
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1st Author's Name |
Yoshio Ashizawa |
1st Author's Affiliation |
FUJITSU LABORATORIES LTD. (FUJITSU LABORATORIES) |
2nd Author's Name |
Hideki Oka |
2nd Author's Affiliation |
FUJITSU LABORATORIES LTD. (FUJITSU LABORATORIES) |
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Speaker |
Author-1 |
Date Time |
2006-09-26 10:25:00 |
Presentation Time |
25 minutes |
Registration for |
SDM |
Paper # |
VLD2006-40, SDM2006-161 |
Volume (vol) |
vol.106 |
Number (no) |
no.254(VLD), no.256(SDM) |
Page |
pp.7-12 |
#Pages |
6 |
Date of Issue |
2006-09-18 (VLD, SDM) |
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