| Paper Abstract and Keywords |
| Presentation |
2007-06-16 10:10
Anodic oxidation on n-GaN surface using photoelectrochemical process Nanako Shiozaki, Tamotsu Hashizume (Hokkaido Univ.) ED2007-42 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
This paper reports the feasibility of oxidation on n-GaN surface using photoelectrochemical process in a mixed solution with glycol solution. The sample was immersed into the mixed solution with tartaric acid and propylene glycol. Then, bias voltage was applied on the surface under UV illumination. The XPS measurement revealed the surface was oxidized to form the gallium oxide. The quality of the surface and layer varied according to the conditions such as processing time and bias voltage. When the combination of the ramp and constant bias form was used as applied voltage, the photoluminescence on the processed surface presented the 3-times increase in intensity. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
GaN / anodic oxidation / photoelectrochemical / gallium oxide / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 107, no. 95, ED2007-42, pp. 61-65, June 2007. |
| Paper # |
ED2007-42 |
| Date of Issue |
2007-06-08 (ED) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
ED2007-42 |
| Conference Information |
| Committee |
ED |
| Conference Date |
2007-06-15 - 2007-06-16 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Toyama Univ. |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
Compound Semiconductor Process, Device, etc |
| Paper Information |
| Registration To |
ED |
| Conference Code |
2007-06-ED |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Anodic oxidation on n-GaN surface using photoelectrochemical process |
| Sub Title (in English) |
|
| Keyword(1) |
GaN |
| Keyword(2) |
anodic oxidation |
| Keyword(3) |
photoelectrochemical |
| Keyword(4) |
gallium oxide |
| Keyword(5) |
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| Keyword(6) |
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| Keyword(8) |
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| 1st Author's Name |
Nanako Shiozaki |
| 1st Author's Affiliation |
Graduate School of Information Science and Technology, Research Center for Integrated Quantum Electronics, Hokkaido University (Hokkaido Univ.) |
| 2nd Author's Name |
Tamotsu Hashizume |
| 2nd Author's Affiliation |
Graduate School of Information Science and Technology, Research Center for Integrated Quantum Electronics, Hokkaido University (Hokkaido Univ.) |
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| Speaker |
Author-1 |
| Date Time |
2007-06-16 10:10:00 |
| Presentation Time |
25 minutes |
| Registration for |
ED |
| Paper # |
ED2007-42 |
| Volume (vol) |
vol.107 |
| Number (no) |
no.95 |
| Page |
pp.61-65 |
| #Pages |
5 |
| Date of Issue |
2007-06-08 (ED) |