| Paper Abstract and Keywords |
| Presentation |
2007-06-16 10:35
Surface passivation of AlGaN/GaN HFETs by RF magnetron sputtering using AlN target Nariaki Tanaka (JAIST), Yasunobu Sumida (POWDEC), Toshi-kazu Suzuki (JAIST) ED2007-43 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
We have investigated AlN surface passivation for AlGaN/GaN heterojunction field-effect transistors (HFETs). After the formation of passivation films by RF magnetron sputtering using AlN target, increases in the channel sheet resistance due to the process damage are observed. However, this damage can be eliminated by thermal annealing in $ \rm N_2 $ ambient. The resultant devices exhibit increases in the drain current and the transconductance, which are more prominent for thicker AlN films. This indicates that the AlN films cause not only the surface passivation effects but also improvements in thermal management. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
AlGaN/GaN HFET / AlN passivation / process damage / / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 107, no. 95, ED2007-43, pp. 67-70, June 2007. |
| Paper # |
ED2007-43 |
| Date of Issue |
2007-06-08 (ED) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
ED2007-43 |
| Conference Information |
| Committee |
ED |
| Conference Date |
2007-06-15 - 2007-06-16 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Toyama Univ. |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
Compound Semiconductor Process, Device, etc |
| Paper Information |
| Registration To |
ED |
| Conference Code |
2007-06-ED |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Surface passivation of AlGaN/GaN HFETs by RF magnetron sputtering using AlN target |
| Sub Title (in English) |
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| Keyword(1) |
AlGaN/GaN HFET |
| Keyword(2) |
AlN passivation |
| Keyword(3) |
process damage |
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| 1st Author's Name |
Nariaki Tanaka |
| 1st Author's Affiliation |
Japan Advanced Institute of Science and Technology (JAIST) |
| 2nd Author's Name |
Yasunobu Sumida |
| 2nd Author's Affiliation |
POWDEC K.K. (POWDEC) |
| 3rd Author's Name |
Toshi-kazu Suzuki |
| 3rd Author's Affiliation |
Japan Advanced Institute of Science and Technology (JAIST) |
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| Speaker |
Author-1 |
| Date Time |
2007-06-16 10:35:00 |
| Presentation Time |
25 minutes |
| Registration for |
ED |
| Paper # |
ED2007-43 |
| Volume (vol) |
vol.107 |
| Number (no) |
no.95 |
| Page |
pp.67-70 |
| #Pages |
4 |
| Date of Issue |
2007-06-08 (ED) |