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| Presentation | 2007-09-28 13:00 SH-SAW propagation characteristics in (11-20) ZnO film/silica glass substrate structures Atsushi Tanaka (Doshisha Univ.), Takahiko Yanagitani (Tohoku Univ.), Mami Matsukawa, Yoshiaki Watanabe (Doshisha Univ.)  US2007-48 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | We have reported the fabrication of the (11-20) textured ZnO film without epitaxial technique. An IDT on the (11-20) textured ZnO film can excite SH-SAW. Therefore, the film on various substrates is an attractive option for fabricating the SH-SAW device on a silicon IC, and the device on a curved surface. In this report, the electromechanical coupling coefficients K2 in the ZnO (0º, 90º, ) films/silica glass substrate structures were theoretically estimated. The theoretical results showed that the IDT electrode/ZnO (0º, 90º, 55º) film/silica glass substrate structure had a relatively high K2 value of 3.4 % at H/=0.21. This structure was then fabricated using RF magnetron sputtering technique. The experimental results demonstrated that SH-SAW was clearly excited in the structure. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | (11-20) textured ZnO film / SH-SAW / RF magnetron sputtering / / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 107, no. 233, US2007-48, pp. 31-36, Sept. 2007. | |
| Paper # | US2007-48 | |
| Date of Issue | 2007-09-21 (US) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | US2007-48 |
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| Conference Information | |
| Committee | US |
| Conference Date | 2007-09-27 - 2007-09-28 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Tohoku Univ. |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | General |
| Paper Information | |
| Registration To | US |
| Conference Code | 2007-09-US |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | SH-SAW propagation characteristics in (11-20) ZnO film/silica glass substrate structures |
| Sub Title (in English) | |
| Keyword(1) | (11-20) textured ZnO film |
| Keyword(2) | SH-SAW |
| Keyword(3) | RF magnetron sputtering |
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| 1st Author's Name | Atsushi Tanaka |
| 1st Author's Affiliation | Doshisha University (Doshisha Univ.) |
| 2nd Author's Name | Takahiko Yanagitani |
| 2nd Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 3rd Author's Name | Mami Matsukawa |
| 3rd Author's Affiliation | Doshisha University (Doshisha Univ.) |
| 4th Author's Name | Yoshiaki Watanabe |
| 4th Author's Affiliation | Doshisha University (Doshisha Univ.) |
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| Speaker | Author-1 |
| Date Time | 2007-09-28 13:00:00 |
| Presentation Time | 30 minutes |
| Registration for | US |
| Paper # | US2007-48 |
| Volume (vol) | vol.107 |
| Number (no) | no.233 |
| Page | pp.31-36 |
| #Pages | 6 |
| Date of Issue | 2007-09-21 (US) |
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