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Paper Abstract and Keywords
Presentation 2007-10-26 13:00
[Invited Talk] Tailoring microdomain orientation in block copolymer thin films for lithographic application
Hiroshi Yoshida (Hitachi), Satoshi Akasaka, Feng Chen, Mikihito Takenaka, Hirokazu Hasegawa (Kyoto Univ.) OME2007-43
Abstract (in Japanese) (See Japanese page) 
(in English) It has been established that thin film of block copolymers can be used as templates for nano-size devices fabrication, referred as block copolymer lithography. However, realizing the full potential in thin film applications requires controlling ordering and orientation of microdomain, so as to tailor the continuous thin films into desired patterns. In this report, attempts to control the domain orientation are reviewed. Particularly, we show a simple route to control perpendicular orientation of cylindrical domains in thin film via binary blending asymmetric polystyrene-block- poly(methyl methacrylate).
Keyword (in Japanese) (See Japanese page) 
(in English) Self-assembly / Block copolymer / Lithography / / / / /  
Reference Info. IEICE Tech. Rep., vol. 107, no. 292, OME2007-43, pp. 1-6, Oct. 2007.
Paper # OME2007-43 
Date of Issue 2007-10-19 (OME) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee OME  
Conference Date 2007-10-26 - 2007-10-26 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan Bldg. 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To OME 
Conference Code 2007-10-OME 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Tailoring microdomain orientation in block copolymer thin films for lithographic application 
Sub Title (in English)  
Keyword(1) Self-assembly  
Keyword(2) Block copolymer  
Keyword(3) Lithography  
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1st Author's Name Hiroshi Yoshida  
1st Author's Affiliation Hitachi Ltd. (Hitachi)
2nd Author's Name Satoshi Akasaka  
2nd Author's Affiliation Kyoto University (Kyoto Univ.)
3rd Author's Name Feng Chen  
3rd Author's Affiliation Kyoto University (Kyoto Univ.)
4th Author's Name Mikihito Takenaka  
4th Author's Affiliation Kyoto University (Kyoto Univ.)
5th Author's Name Hirokazu Hasegawa  
5th Author's Affiliation Kyoto University (Kyoto Univ.)
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Speaker Author-1 
Date Time 2007-10-26 13:00:00 
Presentation Time 45 minutes 
Registration for OME 
Paper # OME2007-43 
Volume (vol) vol.107 
Number (no) no.292 
Page pp.1-6 
#Pages 6 
Date of Issue 2007-10-19 (OME) 

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