| Paper Abstract and Keywords |
| Presentation |
2008-01-25 15:20
Technical issues of etching process for Nb-junction circuit technology
-- Reactive ion etching (RIE) of Nb films --
Masaaki Maezawa, Fuminori Hirayama, Sucheta Gorwadkar (AIST) |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
Reactive ion etching (RIE) techniques for Nb films are presented. We report in detail experimental results which were obtained during optimization of our standard Nb/AlOx/Nb-junction technology for superconductor integrated circuits. Technical issues including dependence of etch depth on RIE time, controllability of pattern shifts and intra-layer short defects are described. We also discuss possible damage to the junctions associated with plasma-induced currents during RIE processes. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
Josephson junction / Rapid Single Flux Quantum / RSFQ / Superconductor circuit / RIE / Reactive ion etching / / |
| Reference Info. |
IEICE Tech. Rep., vol. 107, no. 458, SCE2007-30, pp. 29-33, Jan. 2008. |
| Paper # |
SCE2007-30 |
| Date of Issue |
2008-01-18 (SCE) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
| Download PDF |
|
| Conference Information |
| Committee |
SCE |
| Conference Date |
2008-01-25 - 2008-01-25 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Kikai-Shinko-Kaikan Bldg. |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
Digital applications |
| Paper Information |
| Registration To |
SCE |
| Conference Code |
2008-01-SCE |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Technical issues of etching process for Nb-junction circuit technology |
| Sub Title (in English) |
Reactive ion etching (RIE) of Nb films |
| Keyword(1) |
Josephson junction |
| Keyword(2) |
Rapid Single Flux Quantum |
| Keyword(3) |
RSFQ |
| Keyword(4) |
Superconductor circuit |
| Keyword(5) |
RIE |
| Keyword(6) |
Reactive ion etching |
| Keyword(7) |
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| Keyword(8) |
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| 1st Author's Name |
Masaaki Maezawa |
| 1st Author's Affiliation |
National Institute of Advanced Industrial Science and Technology (AIST) |
| 2nd Author's Name |
Fuminori Hirayama |
| 2nd Author's Affiliation |
National Institute of Advanced Industrial Science and Technology (AIST) |
| 3rd Author's Name |
Sucheta Gorwadkar |
| 3rd Author's Affiliation |
National Institute of Advanced Industrial Science and Technology (AIST) |
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| Speaker |
Author-1 |
| Date Time |
2008-01-25 15:20:00 |
| Presentation Time |
25 minutes |
| Registration for |
SCE |
| Paper # |
SCE2007-30 |
| Volume (vol) |
vol.107 |
| Number (no) |
no.458 |
| Page |
pp.29-33 |
| #Pages |
5 |
| Date of Issue |
2008-01-18 (SCE) |