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Paper Abstract and Keywords
Presentation 2008-03-07 15:50
An analytical study for copper surface oxide film
Yousuke Takayashiki, Atsu Komiya, Isao Minowa (Tamagawa Univ.), Yousuke Takayashiki, Hajime Takada, Yoshihiko Watanabe (Yazaki Corp．) EMD2007-134
Abstract (in Japanese) (See Japanese page) 
(in English) An analytical study for the structure of oxide film on copper surface has been performed by both methods of contact resistance measurement and Auger electron spectroscopy(AES). Gold evaporated deposited film are covered on the oxide surface to reduce constriction resistance between moving contact gold wire and copper. Contact resistances were changed as oscillatory increasing as the past study. Furthermore, atoms of surface were detected and also thickness of surface film layers were measured by AES.
Keyword (in Japanese) (See Japanese page) 
(in English) contact resistance / copper oxide film / constriction resistance / film resistance / AES / / /  
Reference Info. IEICE Tech. Rep., vol. 107, no. 534, EMD2007-134, pp. 41-44, March 2008.
Paper # EMD2007-134 
Date of Issue 2008-02-29 (EMD) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF EMD2007-134

Conference Information
Committee EMD  
Conference Date 2008-03-07 - 2008-03-07 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To EMD 
Conference Code 2008-03-EMD 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) An analytical study for copper surface oxide film 
Sub Title (in English)  
Keyword(1) contact resistance  
Keyword(2) copper oxide film  
Keyword(3) constriction resistance  
Keyword(4) film resistance  
Keyword(5) AES  
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1st Author's Name Yousuke Takayashiki  
1st Author's Affiliation Tamagawa University (Tamagawa Univ.)
2nd Author's Name Atsu Komiya  
2nd Author's Affiliation Tamagawa University (Tamagawa Univ.)
3rd Author's Name Isao Minowa  
3rd Author's Affiliation Tamagawa University (Tamagawa Univ.)
4th Author's Name Yousuke Takayashiki  
4th Author's Affiliation Yazaki Corporation (Yazaki Corp．)
5th Author's Name Hajime Takada  
5th Author's Affiliation Yazaki Corporation (Yazaki Corp．)
6th Author's Name Yoshihiko Watanabe  
6th Author's Affiliation Yazaki Corporation (Yazaki Corp．)
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Speaker Author-1 
Date Time 2008-03-07 15:50:00 
Presentation Time 15 minutes 
Registration for EMD 
Paper # EMD2007-134 
Volume (vol) vol.107 
Number (no) no.534 
Page pp.41-44 
#Pages 4 
Date of Issue 2008-02-29 (EMD) 

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