| Paper Abstract and Keywords |
| Presentation |
2008-04-17 10:15
[Invited Talk]
65nm Low-Power High-Density SRAM Operable at 1.0V under 3sigma Systematic Variation Using Separate Vth Monitoring and Body Bias for NMOS and PMOS Masanao Yamaoka (Hitachi, Ltd.), Noriaki Maeda, Yasuhisa Shimazaki (Renesas), Kenichi Osada (Hitachi, Ltd.) ICD2008-2 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
A 1Mb SRAM is fabricated in 65nm LP process with 0.51μm2 cell. An NMOS and PMOS separately applied body bias technique and NMOS and PMOS individual Vth measurement method using leakage control are implemented to the prototype chip, which achieves 1.0-V operation under 3-σ systematic Vth variation. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
low-power SRAM / body bias / Vth measurement / / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 108, no. 6, ICD2008-2, pp. 7-12, April 2008. |
| Paper # |
ICD2008-2 |
| Date of Issue |
2008-04-10 (ICD) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
ICD2008-2 |
| Conference Information |
| Committee |
ICD |
| Conference Date |
2008-04-17 - 2008-04-18 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
|
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
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| Paper Information |
| Registration To |
ICD |
| Conference Code |
2008-04-ICD |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
65nm Low-Power High-Density SRAM Operable at 1.0V under 3sigma Systematic Variation Using Separate Vth Monitoring and Body Bias for NMOS and PMOS |
| Sub Title (in English) |
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| Keyword(1) |
low-power SRAM |
| Keyword(2) |
body bias |
| Keyword(3) |
Vth measurement |
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| 1st Author's Name |
Masanao Yamaoka |
| 1st Author's Affiliation |
Hitachi, Ltd. (Hitachi, Ltd.) |
| 2nd Author's Name |
Noriaki Maeda |
| 2nd Author's Affiliation |
Renesas Technology Corp. (Renesas) |
| 3rd Author's Name |
Yasuhisa Shimazaki |
| 3rd Author's Affiliation |
Renesas Technology Corp. (Renesas) |
| 4th Author's Name |
Kenichi Osada |
| 4th Author's Affiliation |
Hitachi, Ltd. (Hitachi, Ltd.) |
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| Speaker |
Author-1 |
| Date Time |
2008-04-17 10:15:00 |
| Presentation Time |
50 minutes |
| Registration for |
ICD |
| Paper # |
ICD2008-2 |
| Volume (vol) |
vol.108 |
| Number (no) |
no.6 |
| Page |
pp.7-12 |
| #Pages |
6 |
| Date of Issue |
2008-04-10 (ICD) |