| Paper Abstract and Keywords |
| Presentation |
2008-04-18 15:20
[Invited Talk]
Electrode Material Dependence on Binary Oxide RRAM Characteristics Yukio Tamai (Sharp), Hisashi Shima, Hiroyuki Akinaga (AIST), Yasunari Hosoi, Shigeo Ohnishi, Nobuyoshi Awaya (Sharp) ICD2008-15 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
We have synthesized Ta/Co-O/Pt RRRAM and 20ns high-speed switching and low writing current around 100$\mu$A with excellent endurance reliability was demonstrated. The electrode materials which are easily oxidized at the electrode/oxide interface and the interface oxides have a high resistivity lower the erasing current significantly by current regulation during forming. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
RRAM / Nonvolatile Memory / High Speed / Low Writing Current / Binary Oxide / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 108, no. 6, ICD2008-15, pp. 79-82, April 2008. |
| Paper # |
ICD2008-15 |
| Date of Issue |
2008-04-10 (ICD) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
ICD2008-15 |
| Conference Information |
| Committee |
ICD |
| Conference Date |
2008-04-17 - 2008-04-18 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
|
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
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| Paper Information |
| Registration To |
ICD |
| Conference Code |
2008-04-ICD |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Electrode Material Dependence on Binary Oxide RRAM Characteristics |
| Sub Title (in English) |
|
| Keyword(1) |
RRAM |
| Keyword(2) |
Nonvolatile Memory |
| Keyword(3) |
High Speed |
| Keyword(4) |
Low Writing Current |
| Keyword(5) |
Binary Oxide |
| Keyword(6) |
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| Keyword(7) |
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| Keyword(8) |
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| 1st Author's Name |
Yukio Tamai |
| 1st Author's Affiliation |
Sharp Corporation (Sharp) |
| 2nd Author's Name |
Hisashi Shima |
| 2nd Author's Affiliation |
National Institute of Advanced Industrial Science and Technology (AIST) |
| 3rd Author's Name |
Hiroyuki Akinaga |
| 3rd Author's Affiliation |
National Institute of Advanced Industrial Science and Technology (AIST) |
| 4th Author's Name |
Yasunari Hosoi |
| 4th Author's Affiliation |
Sharp Corporation (Sharp) |
| 5th Author's Name |
Shigeo Ohnishi |
| 5th Author's Affiliation |
Sharp Corporation (Sharp) |
| 6th Author's Name |
Nobuyoshi Awaya |
| 6th Author's Affiliation |
Sharp Corporation (Sharp) |
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| Speaker |
Author-1 |
| Date Time |
2008-04-18 15:20:00 |
| Presentation Time |
50 minutes |
| Registration for |
ICD |
| Paper # |
ICD2008-15 |
| Volume (vol) |
vol.108 |
| Number (no) |
no.6 |
| Page |
pp.79-82 |
| #Pages |
4 |
| Date of Issue |
2008-04-10 (ICD) |