Paper Abstract and Keywords |
Presentation |
2008-08-04 14:15
Electron emission from nanocrystalline silicon based MOS chathodes Hidetaka Shimawaki, Yo Kida (Hachinohe Inst. Tech.), Yoichiro Neo, Hidenori Mimura (Shizuoka Univ.), Katsuhisa Murakami, Fujio Wakaya, Mikio Takai (Osaka Univ.) ED2008-112 Link to ES Tech. Rep. Archives: ED2008-112 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Emission characteristics of planar cathodes based on nanocrystalline Si covered with a thin oxide film have been studied. The electron emission occurred at the gate voltage higher than the work function of the Au gate, and the emission efficiency was improved up to 4 % by reducing the thickness of Au electrode. A lot of nanoholes in the thin Au film were observed, suggesting emission included electrons directly emitted from nanocrystalline aligned under nanoholes. The energy distribution of emitted electron is also discussed. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
MOS / tunneling cathode / field emitter / electron emission / nanocrystalline silicon / / / |
Reference Info. |
IEICE Tech. Rep., vol. 108, no. 177, ED2008-112, pp. 15-20, Aug. 2008. |
Paper # |
ED2008-112 |
Date of Issue |
2008-07-28 (ED) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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ED2008-112 Link to ES Tech. Rep. Archives: ED2008-112 |