Paper Abstract and Keywords |
Presentation |
2008-10-31 09:00
Examination to suppress that SrAl2O4 films on Al underlayer detach from substrate Feng Zhang, Masakazu Koketsu, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami (Niigata Univ.) CPM2008-82 Link to ES Tech. Rep. Archives: CPM2008-82 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
In order to suppress that SrAl2O4 films on Al underlayer detach from substrate, SrAl2O4 thin films were attempted by post-annealing in
vacuum of the films deposited on Al underlayer using reactive sputtering method. As a result, The Al film was effective to the crystallinity improvement, control of orientation and increase of the luminescence intensity of the SrAl2O4 film. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
SrAl2O4 thin film / long persistent phosphor / post-annealing in vacuum / detach / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 108, no. 269, CPM2008-82, pp. 41-46, Oct. 2008. |
Paper # |
CPM2008-82 |
Date of Issue |
2008-10-23 (CPM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
CPM2008-82 Link to ES Tech. Rep. Archives: CPM2008-82 |
Conference Information |
Committee |
CPM |
Conference Date |
2008-10-30 - 2008-10-31 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Niigata Univ. |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Process of Thin Film formation and Materials, etc. |
Paper Information |
Registration To |
CPM |
Conference Code |
2008-10-CPM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Examination to suppress that SrAl2O4 films on Al underlayer detach from substrate |
Sub Title (in English) |
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Keyword(1) |
SrAl2O4 thin film |
Keyword(2) |
long persistent phosphor |
Keyword(3) |
post-annealing in vacuum |
Keyword(4) |
detach |
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1st Author's Name |
Feng Zhang |
1st Author's Affiliation |
Niigata University (Niigata Univ.) |
2nd Author's Name |
Masakazu Koketsu |
2nd Author's Affiliation |
Niigata University (Niigata Univ.) |
3rd Author's Name |
Hidehiko Shimizu |
3rd Author's Affiliation |
Niigata University (Niigata Univ.) |
4th Author's Name |
Haruo Iwano |
4th Author's Affiliation |
Niigata University (Niigata Univ.) |
5th Author's Name |
Takahiro Kawakami |
5th Author's Affiliation |
Niigata University (Niigata Univ.) |
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Speaker |
Author-1 |
Date Time |
2008-10-31 09:00:00 |
Presentation Time |
25 minutes |
Registration for |
CPM |
Paper # |
CPM2008-82 |
Volume (vol) |
vol.108 |
Number (no) |
no.269 |
Page |
pp.41-46 |
#Pages |
6 |
Date of Issue |
2008-10-23 (CPM) |
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