| Paper Abstract and Keywords |
| Presentation |
2009-04-24 09:25
Fabrication of a Room-temperature Operation Single Electron Transistor through Anodization Process Yasuo Kimura, Takami Muto, Michio Niwano (Tohoku Univ.) ED2009-9 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
In order to fabricate single-electron transistors which can operate at room temperature, it is necessary to arrange a several nanometer nanodot between source and drain electrodes. Therefore, it is important to develop new hybrid processes between top-down and bottom-up processes. In this study, we fabricated single-electron transistors through both anodization process of aluminum and the photolithography technique and demonstrated that it could be operate at room temperature. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
single electron transistor / room-temperature operation / anodization / porous alumina / selfalignment / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 109, no. 16, ED2009-9, pp. 35-38, April 2009. |
| Paper # |
ED2009-9 |
| Date of Issue |
2009-04-16 (ED) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
ED2009-9 |
| Conference Information |
| Committee |
ED |
| Conference Date |
2009-04-23 - 2009-04-24 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Tohoku Univ. |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
TFT, etc |
| Paper Information |
| Registration To |
ED |
| Conference Code |
2009-04-ED |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Fabrication of a Room-temperature Operation Single Electron Transistor through Anodization Process |
| Sub Title (in English) |
|
| Keyword(1) |
single electron transistor |
| Keyword(2) |
room-temperature operation |
| Keyword(3) |
anodization |
| Keyword(4) |
porous alumina |
| Keyword(5) |
selfalignment |
| Keyword(6) |
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| Keyword(7) |
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| Keyword(8) |
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| 1st Author's Name |
Yasuo Kimura |
| 1st Author's Affiliation |
Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University (Tohoku Univ.) |
| 2nd Author's Name |
Takami Muto |
| 2nd Author's Affiliation |
Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University (Tohoku Univ.) |
| 3rd Author's Name |
Michio Niwano |
| 3rd Author's Affiliation |
Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University (Tohoku Univ.) |
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| Speaker |
Author-1 |
| Date Time |
2009-04-24 09:25:00 |
| Presentation Time |
25 minutes |
| Registration for |
ED |
| Paper # |
ED2009-9 |
| Volume (vol) |
vol.109 |
| Number (no) |
no.16 |
| Page |
pp.35-38 |
| #Pages |
4 |
| Date of Issue |
2009-04-16 (ED) |