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Paper Abstract and Keywords
Presentation 2009-06-19 11:20
Electrical Properties of Ge MIS Interface Defects
Noriyuki Taoka, Wataru Mizubayashi, Yukinori Morita, Shinji Migita, Hiroyuki Ota (MIRAI-NIRC), Shinichi Takagi (MIRAI-NIRC/Univ. of Tokyo) SDM2009-30 Link to ES Tech. Rep. Archives: SDM2009-30
Abstract (in Japanese) (See Japanese page) 
(in English) The response of majority and minority carriers with interface traps have been systematically investigated for Ge MIS interfaces with various interface layers by the conductance method based on the conventional model including the only majority carrier response and a newly-proposed model including the both carrier responses with interface traps. The analysis by using the conventional model leads to the inappropriate results of the Ge MIS interface properties near room temperature. On the other hand, the proposed model can accurately characterize ones. As a result, the electron capture cross sections hardly depend on the energy in all samples as similar with those of Si MOS interface traps. This result indicates that the similar defects to a Si MIS interface are formed at the Ge MIS interfaces. Furthermore, the magnitudes of the electron capture cross sections for each sample depend on the oxygen or nitrogen contents of the interface layers, suggesting that the different defect structures exist.
Keyword (in Japanese) (See Japanese page) 
(in English) Germanium / Interface trap / minority carrier / / / / /  
Reference Info. IEICE Tech. Rep., vol. 109, no. 87, SDM2009-30, pp. 21-26, June 2009.
Paper # SDM2009-30 
Date of Issue 2009-06-12 (SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee SDM  
Conference Date 2009-06-19 - 2009-06-19 
Place (in Japanese) (See Japanese page) 
Place (in English) An401・402 Inst. Indus. Sci., The Univ. of Tokyo 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Science and Technology for Dielectric Thin Films for MIS Devices 
Paper Information
Registration To SDM 
Conference Code 2009-06-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Electrical Properties of Ge MIS Interface Defects 
Sub Title (in English)  
Keyword(1) Germanium  
Keyword(2) Interface trap  
Keyword(3) minority carrier  
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1st Author's Name Noriyuki Taoka  
1st Author's Affiliation MIRAI-NIRC (MIRAI-NIRC)
2nd Author's Name Wataru Mizubayashi  
2nd Author's Affiliation MIRAI-NIRC (MIRAI-NIRC)
3rd Author's Name Yukinori Morita  
3rd Author's Affiliation MIRAI-NIRC (MIRAI-NIRC)
4th Author's Name Shinji Migita  
4th Author's Affiliation MIRAI-NIRC (MIRAI-NIRC)
5th Author's Name Hiroyuki Ota  
5th Author's Affiliation MIRAI-NIRC (MIRAI-NIRC)
6th Author's Name Shinichi Takagi  
6th Author's Affiliation MIRAI-NIRC/The University of Tokyo (MIRAI-NIRC/Univ. of Tokyo)
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Speaker Author-1 
Date Time 2009-06-19 11:20:00 
Presentation Time 30 minutes 
Registration for SDM 
Paper # SDM2009-30 
Volume (vol) vol.109 
Number (no) no.87 
Page pp.21-26 
#Pages
Date of Issue 2009-06-12 (SDM) 


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