| Paper Abstract and Keywords |
| Presentation |
2009-06-25 11:30
Formation and application of InP porous structures on p-n substrates Taketomo Sato, Naoki Yoshizawa, Hiroyuki Okazaki, Tamotsu Hashizume (Hokkaido Univ.) ED2009-76 SDM2009-71 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
We demonstrated to form InP porous structures on n-type epitaxial layers grown on p-type (001) substrates. The high-density array of straight pores with 150nm diameter and 5000nm depth was formed by the electrochemical anodization process, where the pore depth could be controlled by the anodization time in the n-type layer. The present p-n InP porous structures show the low optical reflectance in UV-, visible- and near-infrared region. The current transport properties clearly show the rectifying behavior. These features are very promising for practical application to high-efficiency photo-sensitive devices. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
Electrochemical Process / Porous Structure / Indium Phosphide / p-n junction / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 109, no. 97, ED2009-76, pp. 117-120, June 2009. |
| Paper # |
ED2009-76 |
| Date of Issue |
2009-06-17 (ED, SDM) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
ED2009-76 SDM2009-71 |
| Conference Information |
| Committee |
SDM ED |
| Conference Date |
2009-06-24 - 2009-06-26 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Haeundae Grand Hotel, Busan, Korea |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
2009 Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices |
| Paper Information |
| Registration To |
ED |
| Conference Code |
2009-06-SDM-ED |
| Language |
English (Japanese title is available) |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Formation and application of InP porous structures on p-n substrates |
| Sub Title (in English) |
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| Keyword(1) |
Electrochemical Process |
| Keyword(2) |
Porous Structure |
| Keyword(3) |
Indium Phosphide |
| Keyword(4) |
p-n junction |
| Keyword(5) |
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| 1st Author's Name |
Taketomo Sato |
| 1st Author's Affiliation |
Hokkaido University (Hokkaido Univ.) |
| 2nd Author's Name |
Naoki Yoshizawa |
| 2nd Author's Affiliation |
Hokkaido University (Hokkaido Univ.) |
| 3rd Author's Name |
Hiroyuki Okazaki |
| 3rd Author's Affiliation |
Hokkaido University (Hokkaido Univ.) |
| 4th Author's Name |
Tamotsu Hashizume |
| 4th Author's Affiliation |
Hokkaido University (Hokkaido Univ.) |
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| Speaker |
Author-1 |
| Date Time |
2009-06-25 11:30:00 |
| Presentation Time |
15 minutes |
| Registration for |
ED |
| Paper # |
ED2009-76, SDM2009-71 |
| Volume (vol) |
vol.109 |
| Number (no) |
no.97(ED), no.98(SDM) |
| Page |
pp.117-120 |
| #Pages |
4 |
| Date of Issue |
2009-06-17 (ED, SDM) |