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Paper Abstract and Keywords
Presentation 2009-06-25 12:00
Study on Compositional Transition Layers at Gate Dielectrics/Si Interface by using Angle-resolved X-ray Photoelectron Spectroscopy
Tomoyuki Suwa (Tohoku Univ.), Takashi Aratani (Shin-Etsu Chemical), Masaaki Higuchi (TOSHIBA), Sigetoshi Sugawa (Tohoku Univ.), Eiji Ikenaga (JASRI), Jiro Ushio (Hitachi), Hiroshi Nohira (Musashi Inst. of Tech.), Akinobu Teramoto, Tadahiro Ohmi, Takeo Hattori (Tohoku Univ.) ED2009-86 SDM2009-81
Abstract (in Japanese) (See Japanese page) 
(in English) (Not available yet)
Keyword (in Japanese) (See Japanese page) 
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Reference Info. IEICE Tech. Rep., vol. 109, no. 98, SDM2009-81, pp. 157-160, June 2009.
Paper # SDM2009-81 
Date of Issue 2009-06-17 (ED, SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
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reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee SDM ED  
Conference Date 2009-06-24 - 2009-06-26 
Place (in Japanese) (See Japanese page) 
Place (in English) Haeundae Grand Hotel, Busan, Korea 
Topics (in Japanese) (See Japanese page) 
Topics (in English) 2009 Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices 
Paper Information
Registration To SDM 
Conference Code 2009-06-SDM-ED 
Language English 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Study on Compositional Transition Layers at Gate Dielectrics/Si Interface by using Angle-resolved X-ray Photoelectron Spectroscopy 
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1st Author's Name Tomoyuki Suwa  
1st Author's Affiliation New Industry Creation Hatchery Center, Tohoku University (Tohoku Univ.)
2nd Author's Name Takashi Aratani  
2nd Author's Affiliation Shin-Etsu Chemical Co., Ltd. (Shin-Etsu Chemical)
3rd Author's Name Masaaki Higuchi  
3rd Author's Affiliation TOSHIBA CORPORATION, (TOSHIBA)
4th Author's Name Sigetoshi Sugawa  
4th Author's Affiliation Tohoku University (Tohoku Univ.)
5th Author's Name Eiji Ikenaga  
5th Author's Affiliation Japan Synchrotron Radiation Research Institute (JASRI)
6th Author's Name Jiro Ushio  
6th Author's Affiliation Hitachi, Ltd. (Hitachi)
7th Author's Name Hiroshi Nohira  
7th Author's Affiliation Musashi Institute. of Technology. (Musashi Inst. of Tech.)
8th Author's Name Akinobu Teramoto  
8th Author's Affiliation New Industry Creation Hatchery Center, Tohoku University (Tohoku Univ.)
9th Author's Name Tadahiro Ohmi  
9th Author's Affiliation New Industry Creation Hatchery Center, Tohoku University (Tohoku Univ.)
10th Author's Name Takeo Hattori  
10th Author's Affiliation New Industry Creation Hatchery Center, Tohoku University (Tohoku Univ.)
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Speaker Author-1 
Date Time 2009-06-25 12:00:00 
Presentation Time 15 minutes 
Registration for SDM 
Paper # ED2009-86, SDM2009-81 
Volume (vol) vol.109 
Number (no) no.97(ED), no.98(SDM) 
Page pp.157-160 
#Pages 4 
Date of Issue 2009-06-17 (ED, SDM) 

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