Paper Abstract and Keywords |
Presentation |
2009-11-20 14:50
Growth of oxide film on tin plated surface of connector contacts and it effect on contact resistance Yuya Nabeta, Yasushi Saitoh, Shigeru Sawada (Mie Univ.), Yasuhiro Hattori (ANTech), Terutaka Tamai (Mie Univ.) EMD2009-100 Link to ES Tech. Rep. Archives: EMD2009-100 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Tin plating has been applied widely to electrical connector contacts to save the cost. However, the tin plated surfaces are covered with oxide film which is fundamentally different from gold plated surfaces. The oxide film prevents the surface from corrosion. When the film is interposed between contact interface, contact resistance increases. It is necessary to break down mechanically to obtain low contact resistance. However, detail studies on the oxide film on the tin plated surfaces are not found in literatures.
On the other hand, fretting phenomena is very important for connector contacts, particularly, for automotive connectors under vibration. The failure to tin plated caused many times by fretting, and there phenomena are reported in the literatures.
In the present study, growth law of the oxide film on the tin plated surface was found by measurement using an ellipsometry for exposure to the atmosphere. Moreover, the film thickness was identified by TEM (Transmission Electron Microscope). The results well agreed with results obtained by the ellipsometry. Moreover, we could observe successfully that the composition of oxide film on tin plated surface at 120ºC has mixture of amorphous SnO and crystallized SnO2. The contact resistance showed different characteristic by mixture SnO and SnO2 compared with the film at room temperature.
Growth of the oxide film showed the law of three patterns. From this result, oxidation constants in Arrhenius equation were determined. The contact resistance indicated low constant value until 10nm in thickness. This low value is due to conduction mechanisms of thin film. For the thicker film than 10nm, contact resistance increased to 5Ω. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Tin plating / oxide film / contact / electromechanical devices / contact resistance / Arrhenius equation / ellipsometry / |
Reference Info. |
IEICE Tech. Rep., vol. 109, no. 287, EMD2009-100, pp. 133-136, Nov. 2009. |
Paper # |
EMD2009-100 |
Date of Issue |
2009-11-12 (EMD) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
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EMD2009-100 Link to ES Tech. Rep. Archives: EMD2009-100 |
Conference Information |
Committee |
EMD |
Conference Date |
2009-11-19 - 2009-11-20 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Nippon Institute of Technology, Kanda Campus, Tokyo, Japan |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
IS-EMD2009 (9th International Session on Electro-Mechanical Devices) |
Paper Information |
Registration To |
EMD |
Conference Code |
2009-11-EMD |
Language |
English |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Growth of oxide film on tin plated surface of connector contacts and it effect on contact resistance |
Sub Title (in English) |
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Keyword(1) |
Tin plating |
Keyword(2) |
oxide film |
Keyword(3) |
contact |
Keyword(4) |
electromechanical devices |
Keyword(5) |
contact resistance |
Keyword(6) |
Arrhenius equation |
Keyword(7) |
ellipsometry |
Keyword(8) |
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1st Author's Name |
Yuya Nabeta |
1st Author's Affiliation |
Mie University (Mie Univ.) |
2nd Author's Name |
Yasushi Saitoh |
2nd Author's Affiliation |
Mie University (Mie Univ.) |
3rd Author's Name |
Shigeru Sawada |
3rd Author's Affiliation |
Mie University (Mie Univ.) |
4th Author's Name |
Yasuhiro Hattori |
4th Author's Affiliation |
AutoNetworks Technologies Ltd (ANTech) |
5th Author's Name |
Terutaka Tamai |
5th Author's Affiliation |
Mie University (Mie Univ.) |
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Speaker |
Author-1 |
Date Time |
2009-11-20 14:50:00 |
Presentation Time |
20 minutes |
Registration for |
EMD |
Paper # |
EMD2009-100 |
Volume (vol) |
vol.109 |
Number (no) |
no.287 |
Page |
pp.133-136 |
#Pages |
4 |
Date of Issue |
2009-11-12 (EMD) |
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