Paper Abstract and Keywords |
Presentation |
2010-06-18 11:50
Photo corrosion of Metal Gate Electrodes during Wet Daisuke Watanabe (Daikin Industries,Ltd.), Chiharu Kimura, Hidemitsu Aoki (Osaka Univ.) ED2010-46 Link to ES Tech. Rep. Archives: ED2010-46 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Wet processes for removing high-k film involve the risk of enhanced galvanic corrosion at the gate electrode level. We found that the galvanic corrosion of the metal gate in front-end-of-line (FEOL) was markedly enhanced by room light irradiation. Additive surfactants cannot suppress the galvanic corrosion with light irradiation in DHF. The interception of light irradiation during the wet processes in FEOL as well as the wet process in back-end-of-line (BEOL) is also required. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
galvanic corrosion / photo corrosion / High-K / metal gate / wet process / DHF / / |
Reference Info. |
IEICE Tech. Rep., vol. 110, no. 80, ED2010-46, pp. 69-74, June 2010. |
Paper # |
ED2010-46 |
Date of Issue |
2010-06-10 (ED) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
ED2010-46 Link to ES Tech. Rep. Archives: ED2010-46 |
Conference Information |
Committee |
ED |
Conference Date |
2010-06-17 - 2010-06-18 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
JAIST |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Process and device technology of semiconductors (surface, interface, reliability, etc.) |
Paper Information |
Registration To |
ED |
Conference Code |
2010-06-ED |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Photo corrosion of Metal Gate Electrodes during Wet |
Sub Title (in English) |
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Keyword(1) |
galvanic corrosion |
Keyword(2) |
photo corrosion |
Keyword(3) |
High-K |
Keyword(4) |
metal gate |
Keyword(5) |
wet process |
Keyword(6) |
DHF |
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1st Author's Name |
Daisuke Watanabe |
1st Author's Affiliation |
Chemical R&D Center,Daikin Industries,Ltd. (Daikin Industries,Ltd.) |
2nd Author's Name |
Chiharu Kimura |
2nd Author's Affiliation |
Graduate School of Engineering, Osaka University (Osaka Univ.) |
3rd Author's Name |
Hidemitsu Aoki |
3rd Author's Affiliation |
Graduate School of Engineering, Osaka University (Osaka Univ.) |
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Speaker |
Author-1 |
Date Time |
2010-06-18 11:50:00 |
Presentation Time |
25 minutes |
Registration for |
ED |
Paper # |
ED2010-46 |
Volume (vol) |
vol.110 |
Number (no) |
no.80 |
Page |
pp.69-74 |
#Pages |
6 |
Date of Issue |
2010-06-10 (ED) |
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