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Paper Abstract and Keywords
Presentation 2010-06-18 11:50
Photo corrosion of Metal Gate Electrodes during Wet
Daisuke Watanabe (Daikin Industries,Ltd.), Chiharu Kimura, Hidemitsu Aoki (Osaka Univ.) ED2010-46
Abstract (in Japanese) (See Japanese page) 
(in English) Wet processes for removing high-k film involve the risk of enhanced galvanic corrosion at the gate electrode level. We found that the galvanic corrosion of the metal gate in front-end-of-line (FEOL) was markedly enhanced by room light irradiation. Additive surfactants cannot suppress the galvanic corrosion with light irradiation in DHF. The interception of light irradiation during the wet processes in FEOL as well as the wet process in back-end-of-line (BEOL) is also required.
Keyword (in Japanese) (See Japanese page) 
(in English) galvanic corrosion / photo corrosion / High-K / metal gate / wet process / DHF / /  
Reference Info. IEICE Tech. Rep., vol. 110, no. 80, ED2010-46, pp. 69-74, June 2010.
Paper # ED2010-46 
Date of Issue 2010-06-10 (ED) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF ED2010-46

Conference Information
Committee ED  
Conference Date 2010-06-17 - 2010-06-18 
Place (in Japanese) (See Japanese page) 
Place (in English) JAIST 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Process and device technology of semiconductors (surface, interface, reliability, etc.) 
Paper Information
Registration To ED 
Conference Code 2010-06-ED 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Photo corrosion of Metal Gate Electrodes during Wet 
Sub Title (in English)  
Keyword(1) galvanic corrosion  
Keyword(2) photo corrosion  
Keyword(3) High-K  
Keyword(4) metal gate  
Keyword(5) wet process  
Keyword(6) DHF  
Keyword(7)  
Keyword(8)  
1st Author's Name Daisuke Watanabe  
1st Author's Affiliation Chemical R&D Center,Daikin Industries,Ltd. (Daikin Industries,Ltd.)
2nd Author's Name Chiharu Kimura  
2nd Author's Affiliation Graduate School of Engineering, Osaka University (Osaka Univ.)
3rd Author's Name Hidemitsu Aoki  
3rd Author's Affiliation Graduate School of Engineering, Osaka University (Osaka Univ.)
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Speaker Author-1 
Date Time 2010-06-18 11:50:00 
Presentation Time 25 minutes 
Registration for ED 
Paper # ED2010-46 
Volume (vol) vol.110 
Number (no) no.80 
Page pp.69-74 
#Pages 6 
Date of Issue 2010-06-10 (ED) 

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