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| Presentation | 2010-06-22 10:45 Nickel silicide Encroachment in Silicon Nanowire and its Suppression Naoto Shigemori, Soshi Sato, Kuniyuki Kakushima, Parhat Ahmet, Kazuo Tsutsui, Akira Nishiyama, Nobuyuki Sugii, Kenji Natori, Takeo Hattori, Hiroshi Iwai (Tokyo Inst. of Tech.)  SDM2010-36 Link to ES Tech. Rep. Archives: SDM2010-36 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | Ni silicide in the Si Nanowire shows a reaction different from the reaction with the bulk substrate from the influence of wire shape and a surrounding oxide. We investigate the phenomenon of making to silicide through the experiment that changes the wire diameter and the annealing temperature. And, we propose the method of controlling the Ni silicide reaction. In addition, the effect of the size of the Ni silicide formation in the Si Nanowire was evaluated. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Si nanowire / Nisilicide / Control of Ni diffusion / / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 110, no. 90, SDM2010-36, pp. 17-22, June 2010. | |
| Paper # | SDM2010-36 | |
| Date of Issue | 2010-06-15 (SDM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | SDM2010-36 Link to ES Tech. Rep. Archives: SDM2010-36 |
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| Conference Information | |
| Committee | SDM |
| Conference Date | 2010-06-22 - 2010-06-22 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | An401・402 Inst. Indus. Sci., The Univ. of Tokyo |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Science and Technology for Dielectric Thin Films for MIS Devices |
| Paper Information | |
| Registration To | SDM |
| Conference Code | 2010-06-SDM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Nickel silicide Encroachment in Silicon Nanowire and its Suppression |
| Sub Title (in English) | |
| Keyword(1) | Si nanowire |
| Keyword(2) | Nisilicide |
| Keyword(3) | Control of Ni diffusion |
| Keyword(4) | |
| Keyword(5) | |
| Keyword(6) | |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Naoto Shigemori |
| 1st Author's Affiliation | Tokyo Institute of Technology (Tokyo Inst. of Tech.) |
| 2nd Author's Name | Soshi Sato |
| 2nd Author's Affiliation | Tokyo Institute of Technology (Tokyo Inst. of Tech.) |
| 3rd Author's Name | Kuniyuki Kakushima |
| 3rd Author's Affiliation | Tokyo Institute of Technology (Tokyo Inst. of Tech.) |
| 4th Author's Name | Parhat Ahmet |
| 4th Author's Affiliation | Tokyo Institute of Technology (Tokyo Inst. of Tech.) |
| 5th Author's Name | Kazuo Tsutsui |
| 5th Author's Affiliation | Tokyo Institute of Technology (Tokyo Inst. of Tech.) |
| 6th Author's Name | Akira Nishiyama |
| 6th Author's Affiliation | Tokyo Institute of Technology (Tokyo Inst. of Tech.) |
| 7th Author's Name | Nobuyuki Sugii |
| 7th Author's Affiliation | Tokyo Institute of Technology (Tokyo Inst. of Tech.) |
| 8th Author's Name | Kenji Natori |
| 8th Author's Affiliation | Tokyo Institute of Technology (Tokyo Inst. of Tech.) |
| 9th Author's Name | Takeo Hattori |
| 9th Author's Affiliation | Tokyo Institute of Technology (Tokyo Inst. of Tech.) |
| 10th Author's Name | Hiroshi Iwai |
| 10th Author's Affiliation | Tokyo Institute of Technology (Tokyo Inst. of Tech.) |
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| Speaker | Author-1 |
| Date Time | 2010-06-22 10:45:00 |
| Presentation Time | 25 minutes |
| Registration for | SDM |
| Paper # | SDM2010-36 |
| Volume (vol) | vol.110 |
| Number (no) | no.90 |
| Page | pp.17-22 |
| #Pages | 6 |
| Date of Issue | 2010-06-15 (SDM) |
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