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Paper Abstract and Keywords
Presentation 2010-09-30 11:40
Fabrication of Film Bulk Acoustic Resonator Using Structure of Ta2O5 Thin Film/Si Substrate
Akinori Tsuchiya, Shoji Kakio (Yamanashi Univ.), Yasuhiko Nakagawa (Prof. Emeritus, Yamanashi Univ.) US2010-64
Abstract (in Japanese) (See Japanese page) 
(in English) Highly X-axis-oriented tantalum pentoxide (Ta2O5) piezoelectric thin films were deposited using an RF-magnetron sputtering system with a metal tantalum target and an O2-radical source. The degree of orientation, the Rayleigh-type surface acoustic wave properties, surface roughness and composition ratio were evaluated on SiO2 substrate. Moreover, an FBAR using Ta2O5 thin film/Si substrate structure was fabricated and the resonant characteristic was evaluated. When the substrate temperature was higher than 700˚C, the plane spacing equal to the unit cell and relatively large piezoelectricity were measured. When the film thickness was 1.4 μm, the resonant characteristic was observed at 1.7 GHz for the fabrication of FBAR.
Keyword (in Japanese) (See Japanese page) 
(in English) Piezoelectric thin film / Tantalum pentoxide / Orientation, / Surface acoustic wave / Coupling factor / FBAR / /  
Reference Info. IEICE Tech. Rep., vol. 110, no. 213, US2010-64, pp. 87-92, Sept. 2010.
Paper # US2010-64 
Date of Issue 2010-09-22 (US) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee US  
Conference Date 2010-09-29 - 2010-09-30 
Place (in Japanese) (See Japanese page) 
Place (in English) Tohoku Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) General 
Paper Information
Registration To US 
Conference Code 2010-09-US 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Fabrication of Film Bulk Acoustic Resonator Using Structure of Ta2O5 Thin Film/Si Substrate 
Sub Title (in English)  
Keyword(1) Piezoelectric thin film  
Keyword(2) Tantalum pentoxide  
Keyword(3) Orientation,  
Keyword(4) Surface acoustic wave  
Keyword(5) Coupling factor  
Keyword(6) FBAR  
Keyword(7)  
Keyword(8)  
1st Author's Name Akinori Tsuchiya  
1st Author's Affiliation University of Yamanashi (Yamanashi Univ.)
2nd Author's Name Shoji Kakio  
2nd Author's Affiliation University of Yamanashi (Yamanashi Univ.)
3rd Author's Name Yasuhiko Nakagawa  
3rd Author's Affiliation Professor Emeritus, University of Yamanashi (Prof. Emeritus, Yamanashi Univ.)
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Speaker Author-1 
Date Time 2010-09-30 11:40:00 
Presentation Time 25 minutes 
Registration for US 
Paper # US2010-64 
Volume (vol) vol.110 
Number (no) no.213 
Page pp.87-92 
#Pages 6 
Date of Issue 2010-09-22 (US) 

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