Paper Abstract and Keywords |
Presentation |
2010-10-22 15:20
Development of Automated System of Ultra-Accelerated Quantum Chemical Molecular Dynamics Method and Its Application to Silicon/Insulator Interface Formation Technologies Hideyuki Tsuboi, Kenji Inaba, Mariko Ise, Yukie Hayashi, Yuka Suzuki, Hiromi Sato, Yukiko Obara, Ryo Nagumo, Ryuji Miura, Ai Suzuki, Nozomu Hatakeyama, Akira Endou, Hiromitsu Takaba, Momoji Kubo, Akira Miyamoto (Tohoku Univ.) SDM2010-168 Link to ES Tech. Rep. Archives: SDM2010-168 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
The automated system of ultra-accelerated quantum chemical molecular dynamics method (UA-QCMD) has been developed. The new UA-QCMD simulator consisted of continuous combination of the following two parts. The first part consists of our original tight-binding quantum chemical simulator “Colors” and the second part is also our classical molecular dynamics simulator “NEW- RYUDO”. We have investigated the initial oxidation process for silicon/insulator interface. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Ultra accelerated quantum chemical molecular dynamics method / / / / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 110, no. 241, SDM2010-168, pp. 67-68, Oct. 2010. |
Paper # |
SDM2010-168 |
Date of Issue |
2010-10-14 (SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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Download PDF |
SDM2010-168 Link to ES Tech. Rep. Archives: SDM2010-168 |