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| Presentation | 2010-10-22 14:40 Detachment properties of fluorinated hydrocarbon containing adsorbed monolayers on a radical-type UV-cured resin Akihiro Kohno, Masaru Nakagawa (Tohoku Univ.)  OME2010-50 Link to ES Tech. Rep. Archives: OME2010-50 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | Adsorbed monolayers from (3,3,3-trifluoropropyl)trimethoxysilane (FAS3), (tridecafluoro-1,1,2,2-tetrahydro- octyl)trimethoxysilane (FAS13), and (heptadecafluoro-1,1,2,2-tetrahydrodecyl)trimethoxysilane (FAS17), were formed by chemical vapor surface modification on silica lens surfaces cleaned by exposure to vacuum ultraviolet (VUV) light at 172 nm. Changes in monolayer-modified lens surfaces concomitant with repeating a cycle of curing to induce the radical polymerization of a UV-curable resin and detaching the UV-cured resin were monitored by contact angle measurement with water and atomic force microscopy to investigate the property of the adsorbed monolayers as antisticking layers in UV nanoimprint lithography. A decrease of the contact angle for water with increasing the number of repeated cycles was mainly responsible for the removal of surface impurities in the form of nanoparticles on detaching the cured resin repeatedly. It was found that recoating the silica lens surface with monolayers from FAS13 and FAS17 after cleaning by VUV-light exposure resulted in the suppression of the decrease in the contact angle. These results indicate that the durability of an antisticking layer in UV nanoimprint lithography is markedly improved by the recoating. We measured adhesion forces generating when UV-cured resin was detached from surface-modified silica superstrates. We report dependences of the kind of fluoroalkyl-containing antisticking molecular layers on the adhesion forces and changes of the adhesion forces by increasing the number of detachment. We propose the antisticking molecular layer suitable for UV nanoimprint lithography. |
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| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | UV nanoimprint lithography / Fluoroalkyl-containing antisticking molecular layers / Adhesive force / / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 110, no. 243, OME2010-50, pp. 21-25, Oct. 2010. | |
| Paper # | OME2010-50 | |
| Date of Issue | 2010-10-15 (OME) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | OME2010-50 Link to ES Tech. Rep. Archives: OME2010-50 |
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| Conference Information | |
| Committee | OME |
| Conference Date | 2010-10-22 - 2010-10-22 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | NTT Musashino R&D Center |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Organic Devices, etc |
| Paper Information | |
| Registration To | OME |
| Conference Code | 2010-10-OME |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Detachment properties of fluorinated hydrocarbon containing adsorbed monolayers on a radical-type UV-cured resin |
| Sub Title (in English) | |
| Keyword(1) | UV nanoimprint lithography |
| Keyword(2) | Fluoroalkyl-containing antisticking molecular layers |
| Keyword(3) | Adhesive force |
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| 1st Author's Name | Akihiro Kohno |
| 1st Author's Affiliation | Tohoku University (Tohoku Univ.) |
| 2nd Author's Name | Masaru Nakagawa |
| 2nd Author's Affiliation | Tohoku University (Tohoku Univ.) |
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| Speaker | Author-1 |
| Date Time | 2010-10-22 14:40:00 |
| Presentation Time | 25 minutes |
| Registration for | OME |
| Paper # | OME2010-50 |
| Volume (vol) | vol.110 |
| Number (no) | no.243 |
| Page | pp.21-25 |
| #Pages | 5 |
| Date of Issue | 2010-10-15 (OME) |
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