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Paper Abstract and Keywords
Presentation 2010-10-22 13:25
Deposition polymerization of fluoropolymer thin films by ion-assisted vapor deposition
Tsuyoshi Matsuda (Tokyo Univ. Agricul. & Technol.), Kazuo Senda (Sumitomo Precision), Kuniaki Tanaka, Hiroaki Usui (Tokyo Univ. Agricul. & Technol.) OME2010-47
Abstract (in Japanese) (See Japanese page) 
(in English) Ion-assisted deposition was employed as a new technique for preparing fuluoropolymer thin films. A fluorinated alkylacrylate monomer was deposited on the substrate surface under irradiation of low energy Ar ions. As a consequence, highly hydrophobic fluoropolymer thin films were obtained. However, no films were accumulated when the monomer was deposited without ion irradiation. The films deposited on Au surface had excellent smoothness. On the other hand, the films deposited on glass substrate had considerable extrusions due probably to coagulation of monomer residue. The roughness was improved by rinsing the film with HCFC-225 solvent. By depositing a 100-nm thick film on glass surface, the reflectance was reduced from 8% to 3%.
Keyword (in Japanese) (See Japanese page) 
(in English) ion-assisted deposition / deposition polymerization / fluoropolymer / fluorinated alkylacrylate / antireflective coating / / /  
Reference Info. IEICE Tech. Rep., vol. 110, no. 243, OME2010-47, pp. 5-10, Oct. 2010.
Paper # OME2010-47 
Date of Issue 2010-10-15 (OME) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF OME2010-47

Conference Information
Committee OME  
Conference Date 2010-10-22 - 2010-10-22 
Place (in Japanese) (See Japanese page) 
Place (in English) NTT Musashino R&D Center 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Organic Devices, etc 
Paper Information
Registration To OME 
Conference Code 2010-10-OME 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Deposition polymerization of fluoropolymer thin films by ion-assisted vapor deposition 
Sub Title (in English)  
Keyword(1) ion-assisted deposition  
Keyword(2) deposition polymerization  
Keyword(3) fluoropolymer  
Keyword(4) fluorinated alkylacrylate  
Keyword(5) antireflective coating  
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Keyword(7)  
Keyword(8)  
1st Author's Name Tsuyoshi Matsuda  
1st Author's Affiliation Tokyo University of Agriculture and Technology (Tokyo Univ. Agricul. & Technol.)
2nd Author's Name Kazuo Senda  
2nd Author's Affiliation Sumitomo Precision Products Co.,Ltd. (Sumitomo Precision)
3rd Author's Name Kuniaki Tanaka  
3rd Author's Affiliation Tokyo University of Agriculture and Technology (Tokyo Univ. Agricul. & Technol.)
4th Author's Name Hiroaki Usui  
4th Author's Affiliation Tokyo University of Agriculture and Technology (Tokyo Univ. Agricul. & Technol.)
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Speaker Author-1 
Date Time 2010-10-22 13:25:00 
Presentation Time 25 minutes 
Registration for OME 
Paper # OME2010-47 
Volume (vol) vol.110 
Number (no) no.243 
Page pp.5-10 
#Pages 6 
Date of Issue 2010-10-15 (OME) 

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