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Paper Abstract and Keywords
Presentation 2010-10-22 11:40
Fabrication of Highly Crystalline-Oriented Poly-Si Thin Films by using Double -Line-Beam CLC for High Performance LPTS-TFT
Shin-Ichiro Kuroki, Yuya Kawasaki, Shuntaro Fujii, Koji Kotani (Tohoku Univ.), Takashi Ito (Tokyo Inst. of Tech.) SDM2010-163
Abstract (in Japanese) (See Japanese page) 
(in English) Highly bi-axially oriented poly-Si thin films with very long grains were successfully fabricated on quartz substrates by continuous wave laser crystallization with parallel double-line beams. The newly-developed technique achieved highly-oriented silicon grains having {110}, {111} and {211} crystal orientations in the laser lateral crystallized plane, the transverse side plane and the surface plane, respectively. All the silicon grains were elongated in the laser-scanning direction and linearly arranged with a length of over 100 µm and a width of 0.7 µm.
Keyword (in Japanese) (See Japanese page) 
(in English) Laser crystallization / CLC / Poly-Si / Thin Film Transistor / / / /  
Reference Info. IEICE Tech. Rep., vol. 110, no. 241, SDM2010-163, pp. 45-48, Oct. 2010.
Paper # SDM2010-163 
Date of Issue 2010-10-14 (SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee SDM  
Conference Date 2010-10-21 - 2010-10-22 
Place (in Japanese) (See Japanese page) 
Place (in English) Tohoku University 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Semiconductor process science and new technology 
Paper Information
Registration To SDM 
Conference Code 2010-10-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Fabrication of Highly Crystalline-Oriented Poly-Si Thin Films by using Double -Line-Beam CLC for High Performance LPTS-TFT 
Sub Title (in English)  
Keyword(1) Laser crystallization  
Keyword(2) CLC  
Keyword(3) Poly-Si  
Keyword(4) Thin Film Transistor  
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Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Shin-Ichiro Kuroki  
1st Author's Affiliation Tohoku University (Tohoku Univ.)
2nd Author's Name Yuya Kawasaki  
2nd Author's Affiliation Tohoku University (Tohoku Univ.)
3rd Author's Name Shuntaro Fujii  
3rd Author's Affiliation Tohoku University (Tohoku Univ.)
4th Author's Name Koji Kotani  
4th Author's Affiliation Tohoku University (Tohoku Univ.)
5th Author's Name Takashi Ito  
5th Author's Affiliation Tokyo Institute of Technology (Tokyo Inst. of Tech.)
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Speaker Author-1 
Date Time 2010-10-22 11:40:00 
Presentation Time 30 minutes 
Registration for SDM 
Paper # SDM2010-163 
Volume (vol) vol.110 
Number (no) no.241 
Page pp.45-48 
#Pages 4 
Date of Issue 2010-10-14 (SDM) 

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