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Paper Abstract and Keywords
Presentation 2010-10-29 11:50
Examination of ITO Thin Films Deposited at Low-tempurature for OLEDs by Sputtering Method
Yohei Nakamura, Chang Liu, Hidehiko Shimizu, Haruo Iwano, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) CPM2010-105
Abstract (in Japanese) (See Japanese page) 
(in English) In order to examine problems of the ITO films deposited at the low-temperature, the ITO films was deposited at the low-temperature by combined unbalanced magnetron sputtering method and substrate bias sputtering method. The ITO films deposited at the low-temperature were applied to the organic light emitting diode (OLED). As a result, The crystallinity of the ITO films improved as substrate bias voltage decreases. But, The resistivity of the ITO films did not improve as substrate bias voltage decreases. The characteristic of the voltage-current density and the voltage-luminescence of OLEDs with ITO films deposited at the low-temperature were not good. Therefore, the ITO films prepared in this study were insufficient for the electrode of the OLEDs.
Keyword (in Japanese) (See Japanese page) 
(in English) OLEDs / ITO thin film / low temperature / Unbalanced magnetron sputtering method / / / /  
Reference Info. IEICE Tech. Rep., vol. 110, no. 261, CPM2010-105, pp. 71-75, Oct. 2010.
Paper # CPM2010-105 
Date of Issue 2010-10-21 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
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reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee CPM  
Conference Date 2010-10-28 - 2010-10-29 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To CPM 
Conference Code 2010-10-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Examination of ITO Thin Films Deposited at Low-tempurature for OLEDs by Sputtering Method 
Sub Title (in English)  
Keyword(1) OLEDs  
Keyword(2) ITO thin film  
Keyword(3) low temperature  
Keyword(4) Unbalanced magnetron sputtering method  
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1st Author's Name Yohei Nakamura  
1st Author's Affiliation Niigata University (Niigata Univ.)
2nd Author's Name Chang Liu  
2nd Author's Affiliation Niigata University (Niigata Univ.)
3rd Author's Name Hidehiko Shimizu  
3rd Author's Affiliation Niigata University (Niigata Univ.)
4th Author's Name Haruo Iwano  
4th Author's Affiliation Niigata University (Niigata Univ.)
5th Author's Name Yasuo Fukushima  
5th Author's Affiliation Niigata University (Niigata Univ.)
6th Author's Name Kotaro Nagata  
6th Author's Affiliation Niigata University (Niigata Univ.)
7th Author's Name Yoichi Hoshi  
7th Author's Affiliation Tokyo Polytechnic University (Tokyo Polytechnic Univ.)
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Speaker Author-1 
Date Time 2010-10-29 11:50:00 
Presentation Time 25 minutes 
Registration for CPM 
Paper # CPM2010-105 
Volume (vol) vol.110 
Number (no) no.261 
Page pp.71-75 
#Pages 5 
Date of Issue 2010-10-21 (CPM) 

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