| Paper Abstract and Keywords |
| Presentation |
2011-04-19 16:15
Analyses on Co-relation between Low and High Resistance States in ReRAM Consisting of Binary-Transition-Metal-Oxides Hayato Tanaka (Tottori Univ), Kentaro Kinoshita, Satoru Kishida (Tottori Univ./TEDREC) ICD2011-20 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
Resistive Random Access Memory (ReRAM) is attracting attention as a non-volatile memory for the next generation. The control of reset current is crucial from the standpoint of a practical use, where reset means resistive switching from low to high resistance states. It was reported that the reset current could be decreased by decreasing the compliance current which was imposed for the set process, where set means resistive switching from high to low resistance states. However, even if compliance current is kept at a fixed value, reset current shows the dispersion to some degree. In this study, it was suggested that dispersion of reset current originated in the dispersion of set voltage. A model which explains the dispersion was proposed based on the size dependence of the set voltage and its dispersion. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
ReRAM / NiO / breakdown / oxygen defec / dispersion / size dependence / / |
| Reference Info. |
IEICE Tech. Rep., vol. 111, no. 6, ICD2011-20, pp. 111-116, April 2011. |
| Paper # |
ICD2011-20 |
| Date of Issue |
2011-04-11 (ICD) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
ICD2011-20 |
| Conference Information |
| Committee |
ICD |
| Conference Date |
2011-04-18 - 2011-04-19 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Kobe University Takigawa Memorial Hall |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
Memory Device Technologies |
| Paper Information |
| Registration To |
ICD |
| Conference Code |
2011-04-ICD |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Analyses on Co-relation between Low and High Resistance States in ReRAM Consisting of Binary-Transition-Metal-Oxides |
| Sub Title (in English) |
|
| Keyword(1) |
ReRAM |
| Keyword(2) |
NiO |
| Keyword(3) |
breakdown |
| Keyword(4) |
oxygen defec |
| Keyword(5) |
dispersion |
| Keyword(6) |
size dependence |
| Keyword(7) |
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| Keyword(8) |
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| 1st Author's Name |
Hayato Tanaka |
| 1st Author's Affiliation |
Tottori University (Tottori Univ) |
| 2nd Author's Name |
Kentaro Kinoshita |
| 2nd Author's Affiliation |
Tottori University/ Tottori Univ. Electronic Display Research Center (Tottori Univ./TEDREC) |
| 3rd Author's Name |
Satoru Kishida |
| 3rd Author's Affiliation |
Tottori University/ Tottori Univ. Electronic Display Research Center (Tottori Univ./TEDREC) |
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| Speaker |
Author-1 |
| Date Time |
2011-04-19 16:15:00 |
| Presentation Time |
25 minutes |
| Registration for |
ICD |
| Paper # |
ICD2011-20 |
| Volume (vol) |
vol.111 |
| Number (no) |
no.6 |
| Page |
pp.111-116 |
| #Pages |
6 |
| Date of Issue |
2011-04-11 (ICD) |